Method for manufacturing a device having a three-dimensional magnetic structure

A method for manufacturing a device comprising a three-dimensional magnetic structure, the method comprising:

• applying or introducing magnetic particles onto or into a carrier element, the magnetic particles comprising a size between 10 nm and 10 μm, wherein a plurality of at least partly interconnected cavities are formed between the magnetic particles, and wherein the magnetic particles contact one another at points of contact;
• connecting the magnetic particles at the points of contact by coating the arrangement of magnetic particles and the carrier element, wherein the cavities are penetrated at least partly by a magnetic layer generated based on coating so that the result is the three-dimensional magnetic structure, wherein coating the arrangement of magnetic particles and the carrier element is performed by atomic layer deposition to form the magnetic layer and comprises depositing a dielectric layer after forming the magnetic layer;
• and
• providing a conductor loop arrangement on the carrier element or a further carrier element, such that:
• when a current flows through the conductor loop arrangement, an inductance of the conductor loop arrangement is changed by the three-dimensional magnetic structure;
• or
• when a current flows through the conductor loop arrangement, a force acts on the three-dimensional magnetic structure or the conductor loop arrangement by a magnetic field caused by the current flow;
• or
• when a position of the three-dimensional magnetic structure is changed once or periodically, a current flow is induced through the conductor loop arrangement.