Resist composition and patterning process

A resist composition comprising a base polymer and a quencher, the quencher being an amine compound, wherein the amine compound has the formula (A):

• wherein R1 is hydroxyl, C1-C6 alkyl group, C1-C6 alkoxy group, C2-C6 acyloxy group, fluorine, chlorine, bromine, amino group, —NR1A—C(═O)—R1B, or —NR1A—C(═O)—O—R1B, R1A is hydrogen or a C1-C6 alkyl group, R1B is a C1-C6 alkyl, C2-C8 alkenyl, C6-C12 aryl or C7-C13 aralkyl group,
• R2 is hydrogen, nitro, or a C1-C20 monovalent hydrocarbon group which may contain at least one moiety selected from hydroxyl, carboxyl, thiol, ether bond, ester bond, nitro, cyano, halogen and amino moiety, in case of p=1, R2 may bond together to form a ring with the nitrogen atom to which they are attached, the ring optionally containing a double bond, oxygen, sulfur or nitrogen, or R2 and X may bond together to form a ring with the nitrogen atom to which they are attached, the ring optionally containing a double bond, oxygen, sulfur or nitrogen,
• X is a C1-C20 divalent hydrocarbon group which contains at least one moiety selected from ester bond and ether bond,
• m and n are independently an integer meeting 1≤m≤5, 0≤n≤4 and 1≤m+n≤5, and p is 1, 2 or 3.