Systems for removing air from the fluid circuits of a plasma processing system

A device for priming a plasma processing system comprising:

• a source of a first fluid;
• a first valve;
• a second valve;
• a first pump;
• a prime waste container;
• a third valve;
• a fourth valve;
• a fifth valve;
• a source of a second fluid;
• a first fluid flow path, wherein the first fluid flow path is defined by the source of a first fluid, the first valve positioned between the source of the first fluid and a first fluid flow line, the second valve positioned between the first fluid flow line and a second fluid flow line, the first pump positioned between the second fluid flow line and a third fluid flow line, and the prime waste container in fluid communication with the third fluid flow line;
• and
• a controller, wherein the controller is configured to execute a plurality of programmatic instructions to:
• open the first valve, thereby allowing a flow of fluid from the source of the first fluid to the prime waste container, along the first fluid flow path;
• close the second valve, thereby preventing a flow of fluid from the source of the first fluid to the second fluid flow line, third fluid flow line, and the prime waste container;
• close the first valve, thereby preventing a flow of the first fluid to the first fluid flow line from the source of the first fluid;
• open the third valve, wherein the third valve is positioned between the first fluid flow line and a fourth fluid flow line;
• open the fourth valve, wherein the fourth valve is positioned between the source of the second fluid and the first fluid flow line, thereby enabling a flow of fluid along a second fluid flow path;
• and
• close the third valve and opening the second valve and a fifth valve, wherein the fifth valve is positioned along a third fluid flow path, thereby enabling a flow of fluid along the third fluid flow path to the prime waste container.