CMP polishing system and associated pilot management system
AssigneeUnited Semiconductor (Xiamen) Co., Ltd.
InventorsZhen Yu Sui, You Sheng Yin, Bing Xin Xu, Tao Liu, Wen Yi Tan
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AssigneeUnited Semiconductor (Xiamen) Co., Ltd.
InventorsZhen Yu Sui, You Sheng Yin, Bing Xin Xu, Tao Liu, Wen Yi Tan
Estimating the term…
A dispatch management method for Pilot-run on a computer and applicable to chemical mechanical polishing machines includes: generating initialization work schedules; filtering the initialization work schedules according to respective adaptability parameters to generate intermediate work schedules; performing crossing operations on the intermediate work schedules to generate M sets of crossed work schedules; performing mutation calculations on contents of the intermediate work schedules and the M sets of crossed work schedules to generate mutated work schedules; performing optimization calculations on the intermediate work schedules, the crossed work schedules and the mutated work schedules to generate a target work schedule; and automatically performing dispatch on the CMP machines according to the target work schedule.
A dispatch management method for running a trial production process on a computer and applicable to chemical mechanical polishing (CMP) machines, comprising:
A chemical mechanical polishing (CMP) system, arranged to perform CMP dispatching management by running a trial production process on a computer, the CMP system comprising:
Dependencies are inferred from the claim text.