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US 11,387,315 B2Granted
Patterned shielding structure and integrated inductor
AssigneeRealtek Semiconductor Corp.
InventorsHsiao-Tsung Yen, Ka-Un Chan
Life of this patent
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Abstract
A patterned shielding structure is disposed between an inductor structure and a substrate. The patterned shielding structure includes a shielding layer. The shielding layer includes a first main portion and a plurality of branch portions. The first main portion is T-shaped. The branch portions are connected to the first main portion.
Claims19
A patterned shielding structure disposed between an inductor structure and a substrate, wherein the patterned shielding structure comprises:
- a shielding layer comprising:
- a first main portion being T-shaped;
- and
- a plurality of branch portions connected to the first main portion,
- wherein the first main portion has a first line width, the one of the plurality of branch portions has a second line width, and the first line width is different from the second line width.
2 more elements
An integrated inductor, comprising:
- a substrate;
- an inductor structure;
- and
- a patterned shielding structure disposed between the inductor structure and the substrate, wherein the patterned shielding structure comprises a shielding layer, wherein the shielding layer comprises a first main portion and a plurality of branch portions, wherein the first main portion is T-shaped and is connected to the plurality of branch portions,
- wherein the first main portion has a first line width, the one of the plurality of branch portions has a second line width, and the first line width is different from the second line width.
2 more elements
Dependencies are inferred from the claim text.