Substrate for electro-optical device, electro-optical device, and electronic apparatus

A substrate for an electro-optical device, the substrate comprising:

• a base material comprising a transparent quartz substrate or a glass substrate;
• a transistor including a semiconductor layer, and the semiconductor layer including a polysilicon film;
• a first insulating film comprising a first silicon oxide film, wherein
• the first silicon oxide film comprises fluorine and hydrogen,
• a content of the fluorine in the first silicon oxide film is less than 1.0×1019 atoms/cm3, and
• a content of the hydrogen in the first silicon oxide film is 1.0×1019 atoms/cm3 or more but less than 1.0×1020 atoms/cm3;
• a second insulating film comprising a second silicon oxide film or a silicon nitride film;
• and
• a light-shielding film disposed between the first insulating film and the second insulating film, the first insulating film, the light-shielding film and the second insulating film being disposed between the base material and the semiconductor layer, and the transistor being disposed on the second insulating film.