Semiconductor device
AssigneeMitsubishi Electric Corporation
InventorsKazuhiro Shimizu, Yuji Kawasaki, Toshihiro Imasaka, Manabu Yoshino
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AssigneeMitsubishi Electric Corporation
InventorsKazuhiro Shimizu, Yuji Kawasaki, Toshihiro Imasaka, Manabu Yoshino
Estimating the term…
The semiconductor device that supplies a charging current to a bootstrap capacitor includes a semiconductor layer, an N+-type diffusion region, an N-type diffusion region, a P+-type diffusion region, a P-type diffusion region, an N+-type diffusion region, a source electrode, a drain electrode, a back gate electrode, and a gate electrode. The N+-type diffusion region and the N-type diffusion region are electrically connected to a first electrode of the bootstrap capacitor. The N+-type diffusion region is supplied with a power supply voltage. The source electrode is connected to the N+-type diffusion region and is supplied with the power supply voltage. The back gate electrode is connected to a region separated from the N+-type diffusion region and is grounded. The breakdown voltage between the source electrode and the back gate electrode is greater than the power supply voltage.
A semiconductor device that supplies a charging current to charge a target element, comprising:
Dependencies are inferred from the claim text.