Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

A method of manufacturing a semiconductor device, comprising:

• executing a plural number of times processing of a substrate in a process chamber based on recipe information that describes a procedure that executes the processing of the substrate;
• monitoring process data during executing the processing of the substrate the plural number of times and storing the process data in a memory;
• calculating variation quality data from the process data;
• comparing the variation quality data with comparison data stored in the memory to obtain a reproduction index indicating a reproducibility of the comparison data, and calculating a correction value of setting information included in the recipe information when the reproduction index is below a predetermined value;
• and
• correcting the setting information included in the recipe information with the correction value.

A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform a process, the process including:

• executing a plural number of times processing of a substrate in a process chamber based on recipe information that describes a procedure that executes the processing of the substrate;
• monitoring process data during the executing the processing of the substrate the plural number of times and storing the process data in a memory;
• calculating variation quality data from the process data;
• comparing the variation quality data with comparison data stored in the memory to obtain a reproduction index indicating a reproducibility of the comparison data, and calculating a correction value of setting information included in the recipe information when the reproduction index is below a predetermined value;
• and
• correcting the setting information included in the recipe information with the correction value.