Processing of workpieces with reactive species generated using alkyl halide
AssigneesMattson Technology, Inc., Beijing E-Town Semiconductor Technology Co., Ltd.
InventorsMichael X. Yang, Hua Chung, Xinliang Lu
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Abstract
Methods for material removal of a film, such as a metal nitride film, from a workpiece are provided. One example implementation is directed to a method for processing a workpiece. The workpiece can include a film (e.g., a metal nitride film). The method can include generating one or more species (e.g., hydrogen radicals, excited inert gas molecules, etc.). The method can include mixing alkyl halide with the one or more species to generate one or more alkyl radicals. The method can include exposing the film to the one or more alkyl radicals.
Claims18
A method for processing a workpiece, the workpiece comprising a film, the workpiece disposed in a processing chamber separated from a plasma chamber by a separation grid, the separation grid comprising a first grid plate and a second grid plate, the method comprising:
- generating one or more species in the plasma chamber by inducing a plasma in a process gas using a plasma source;
- mixing alkyl halide with the one or more species using an injection port disposed between the first grid plate and the second grid plate to generate one or more alkyl radicals;
- and
- exposing the film to the one or more alkyl radicals.
A method for processing a workpiece containing a metal and nitrogen containing film, the workpiece disposed in a processing chamber separated from a plasma chamber via a separation grid, the separation grid comprising a first grid plate and a second grid plate, the method comprising:
- generating one or more species in a mixture in the plasma chamber;
- filtering one or more ions in the plasma chamber to generate a filtered mixture;
- injecting one or more alkyl halides in the filtered mixture using an injection port disposed between the first grid plate and second grid plate to generate one or more alkyl radicals;
- exposing the metal and nitrogen containing film to the one or more alkyl radicals in the processing chamber.
Dependencies are inferred from the claim text.