Deposition of organic films
AssigneeASM IP Holding B.V.
InventorsEva E. Tois, Hidemi Suemori, Viljami J. Pore, Suvi P. Haukka, Varun Sharma
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Abstract
Processes are provided herein for deposition of organic films. Organic films can be deposited, including selective deposition on one surface of a substrate relative to a second surface of the substrate. For example, polymer films may be selectively deposited on a first metallic surface relative to a second dielectric surface. Selectivity, as measured by relative thicknesses on the different layers, of above about 50% or even about 90% is achieved. The selectively deposited organic film may be subjected to an etch process to render the process completely selective. Processes are also provided for particular organic film materials, independent of selectivity.
Claims20
A process for selectively forming an organic film, the process comprising:
- providing a substrate with a first surface and a second surface, wherein the first and second surfaces have different compositions, and wherein the first surface comprises an oxidized metal or an oxidized metallic surface;
- cleaning the oxidized metal or oxidized metallic surface of the substrate to leave a cleaned first surface;
- after cleaning the oxidized metal or oxidized metallic surface of the substrate, contacting the first and second surfaces of the substrate with a first vapor phase precursor;
- and
- contacting the first and second surfaces of substrate with a second vapor phase precursor;
- wherein contacting the substrate with the first and second vapor phase precursors forms the organic film selectively on the cleaned first surface relative to the second surface.
A process for selectively forming an organic film, the process comprising:
- providing a substrate with a first surface and a second surface, wherein the first and second surfaces have different compositions, wherein the first surface comprises a metal oxide, an elemental metal or a metallic surface;
- cleaning the first surface of the substrate to leave a cleaned first surface;
- after cleaning the first surface of the substrate, contacting the first and second surfaces of the substrate with a first vapor phase precursor;
- and
- contacting the first and second surfaces substrate with a second vapor phase precursor;
- wherein contacting the substrate with the first and second vapor phase precursors forms the organic film selectively on the first cleaned surface relative to the second surface.
Dependencies are inferred from the claim text.