Substrate support and plasma processing apparatus

A substrate support comprising:

• a main body having a substrate supporting region and an annular region surrounding the substrate supporting region;
• a first ring disposed on the annular region and having a through-hole;
• a second ring disposed on the first ring and having an inner peripheral surface facing an end surface of a substrate on the substrate supporting region;
• and
• a lift pin including a lower rod and an upper rod,
• wherein the lower rod has an upper end surface to be in contact with the first ring, and
• the upper rod extends upward from the upper end surface of the lower rod to be in contact with the second ring through the through-hole of the first ring and has a length greater than a length of the through-hole,
• wherein the first ring includes an inner peripheral region, an intermediate mounting region in which the through-hole is formed and an outer peripheral region, an upper surface of the intermediate mounting region positioned lower than an upper surface of the inner peripheral region and an upper surface of the outer peripheral region, and
• the first ring defines a recess on the intermediate mounting region which receives the second ring on the intermediate mounting region fitted in the recess.