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US 11,387,074 B2Granted
Charged particle beam optical apparatus, exposure apparatus, exposure method, control apparatus, control method, information generation apparatus, information generation method and device manufacturing method
AssigneeNikon Corporation
InventorHiroyuki Nagasaka
Life of this patent
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Abstract
A charged particle beam optical apparatus has a plurality of irradiation optical systems each of which irradiates an object with a charged particle beam and a first control apparatus configured to control a second irradiation optical system on the basis of an operation state of a first irradiation optical system.
Claims10
A charged particle beam optical apparatus comprising:
- a plurality of irradiation optical systems, each of which comprises an electron gun and a deflector and is configured to irradiate an object with a charged particle beam;
- and
- a control apparatus that is configured to control one of the irradiation optical systems based on a plurality of operation states of others of the irradiation optical systems.
A control method of controlling a charged particle beam optical apparatus that is configured to irradiate an object with a charged particle beam from each of a plurality of irradiation optical systems, the control method including:
- obtaining a relationship between an irradiating position of one of the irradiation optical systems and operation states of others of the irradiation optical systems;
- and
- controlling the irradiating position of the one irradiation optical system of the plurality of irradiation optical systems based on the relationship.
Dependencies are inferred from the claim text.