US 11,387,050 B2 · Device architecture

Abstract

The present invention relates to an optoelectronic device comprising: (a) a substrate comprising at least one first electrode, which at least one first electrode comprises a first electrode material, and at least one second electrode, which at least one second electrode comprises a second electrode material; and (b) a photoactive material disposed on the substrate, which photoactive material is in contact with the at least one first electrode and the at least one second electrode, wherein the substrate comprises: a layer of the first electrode material; and, disposed on the layer of the first electrode material, a layer of an insulating material, which layer of an insulating material partially covers the layer of the first electrode material; and, disposed on the layer of the insulating material, the second electrode material, and wherein the photoactive material comprises a crystalline compound, which crystalline compound comprises: one or more first cations selected from metal or metalloid cations; one or more second cations selected from Cs+′RB+, K+, NH4 + and organic cations; and one or more halide or chalcogenide anions. A substrate comprising a first and second electrode and processes are also described.

Claims7

Dependent claims

A process for producing a substrate comprising at least one first electrode comprising a first electrode material, and at least one second electrode comprising a second electrode material;

wherein the substrate comprises:
a layer of the first electrode material;
and,
disposed on the layer of the first electrode material, a layer of an insulating material, wherein the layer of the insulating material partially covers the layer of the first electrode material;
and,
disposed on the layer of the insulating material, the second electrode material, and wherein the process comprises:
(i) providing the layer of the first electrode material disposed on a layer of a base material;
(ii) disposing on the layer of the first electrode material a layer of a resist;
(iii) performing a lithography step to define a second electrode pattern on the layer of the first electrode material;
(iv) then depositing the layer of the insulating material on the layer of the resist with the second electrode pattern defined thereon;
(v) disposing on the layer of the insulating material a layer of the second electrode material;
and
(vi) removing the resist and said insulating material and said second electrode material disposed on the resist.

10 more elements

Dependencies are inferred from the claim text.

Device architecture

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Device architecture

Life of this patent

Abstract

Claims7