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US 11,380,729 B2Granted
Image sensor having lens layer and manufacturing method thereof
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChia-Chan Chen
Life of this patent
Estimating the term…
Abstract
A method includes at least the following steps. A material layer is formed over an image capture chip. A patterned mask layer is formed on the material layer, wherein a pattern density of the patterned mask layer varies from a central region of the patterned mask layer to a periphery region of the patterned mask layer. The material layer is polished by using the patterned mask layer as a mask to form a lens layer including a single lens portion on the image capture chip.
Claims20
A method, comprising:
- forming a material layer over an image capture chip having an optical sensing area, the image capture chip comprising a plurality of sensing pixels arranged in an array within the optical sensing area;
- forming a patterned mask layer on the material layer, wherein a pattern density of the patterned mask layer varies from a central region of the patterned mask layer to a periphery region of the patterned mask layer;
- and
- polishing the material layer by using the patterned mask layer as a mask to form a lens layer comprising a single lens portion on the image capture chip, an optical axis of the single lens portion being substantially aligned with a center of the optical sensing area, wherein the single lens portion entirely covers the optical sensing area.
1 more element
A method, comprising:
- forming a material layer over an image capture chip having an optical sensing area, the image capture chip comprising a plurality of sensing pixels arranged in an array within the optical sensing area;
- forming a patterned mask layer on the material layer;
- and
- polishing the patterned mask layer and the material layer to form a lens layer comprising a single lens portion on the image capture chip, an optical axis of the single lens portion being substantially aligned with a center of the optical sensing area, wherein a central region of the patterned mask layer and a periphery region of the patterned mask layer are polished under different polishing rates, and the single lens portion entirely covers the optical sensing area.
1 more element
An image sensor, comprising:
- an image capture chip having an optical sensing area comprising a plurality of sensing pixels arranged in an array within the optical sensing area;
- and
- a lens layer comprising a single lens portion, the single lens portion entirely covering the optical sensing area of the image capture chip, an orthogonal projection of the single lens portion projecting onto the image capture chip overlapping the optical sensing area, and an optical axis of the single lens portion being substantially aligned with a center of the optical sensing area,
- wherein sidewalls of the image capture chip are substantially aligned with sidewalls of the lens layer.
1 more element
Dependencies are inferred from the claim text.