Apparatus and method for processing substrate

An apparatus for forming a liquid film on a substrate, the apparatus comprising:

• a first process chamber having a first space in which a first substrate is processed;
• a second process chamber having a second space in which a second substrate is processed;
• liquid dispensing units provided in the first and second process chambers and configured to dispense processing liquids to form liquid films on the first and second substrates, respectively;
• air-flow supply units provided in the first and second process chambers and configured to form downward air flows in the first and second spaces, respectively;
• and
• a controller configured to control the liquid dispensing units and the air-flow supply units,
• wherein the liquid dispensing unit provided in the first process chamber includes:
• a first pre-treatment nozzle configured to dispense a pre-treatment liquid onto the first substrate;
• and
• a first coating solution nozzle configured to dispense a coating solution onto the first substrate,
• wherein the liquid dispensing unit provided in the second process chamber includes:
• a second pre-treatment nozzle configured to dispense a pre-treatment liquid onto the second substrate;
• and
• a second coating solution nozzle configured to dispense a coating solution onto the second substrate,
• wherein the controller is configured to control the first pre-treatment nozzle and the second pre-treatment nozzle so that an amount of the pre-treatment liquid supplied to the first substrate is different from an amount of the pre-treatment liquid supplied to the second substrate,
• wherein the controller is configured to control the air-flow supply units so that a speed of the downward air flow formed in the first space when the coating solution is supplied to the first substrate and a speed of the downward air flow formed in the second space when the coating solution is supplied to the second substrate are different,
• wherein the speed of the downward air flow formed in the first space is determined by the amount of the pre-treatment liquid supplied to the first substrate,
• wherein the speed of the downward air flow formed in the second space is determined by the amount of the pre-treatment liquid supplied to the second substrate,
• wherein the controller is configured to control the speed of the downward air flow to be decreased with an increase in the amount of pre-treatment liquid dispensed, and
• wherein the controller is configured to control the speed of the downward air flow to be increased with a decrease in the amount of pre-treatment liquid dispensed.