Plasma processing apparatus
OwnerAndrew Simon Hall Brooks, Gareth Hennighan +4inventors
InventorsAndrew Simon Hall Brooks, Gareth Hennighan, Gianfranco Aresta, Richard Anthony Lione, Shailendra Vikram Singh, Siobhan Marie Woollard
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Abstract
A plasma processing apparatus for processing a substrate using a plasma, comprising: a process chamber in which the processing takes place; a plasma source for providing a plasma to the process chamber; a substrate mount within the process chamber for holding the substrate, the substrate mount comprising a surface having a plurality of apertures.
Claims16
A plasma processing apparatus for processing a substrate using a plasma, comprising:
- a process chamber in which the processing takes place;
- a plasma source for providing a plasma to the process chamber;
- a substrate mount within the process chamber for holding the substrate on a surface of the substrate mount, the surface having a plurality of apertures, wherein the apertures are through-holes extending through an entire thickness of the substrate mount, wherein the through-holes are open spaces without any physical structure within the through-holes, the through-holes configured to increase flow of plasma from a first side of the substrate mount to a second side of the substrate mount.
A plasma processing apparatus for processing a substrate using a plasma, comprising:
- a process chamber in which the processing takes place;
- a plasma source for providing a plasma to the process chamber;
- a substrate mount within the process chamber for holding the substrate on a surface of the substrate mount, the surface having a plurality of apertures, wherein the apertures are through-holes extending through an entire thickness of the substrate mount, wherein the through-holes are open spaces without any physical structure within the through-holes, the through-holes configured to increase flow of plasma from a first side of the substrate mount to a second side of the substrate mount, wherein the substrate mount is a floating electrode;
- and
- wherein the apertures are substantially uniformly distributed over the surface of the substrate mount in a two dimensional grid configuration,
- wherein a width of the apertures is greater than a thickness of the substrate mount.
Dependencies are inferred from the claim text.