Semiconductor manufacturing apparatus

A semiconductor manufacturing apparatus, comprising:

• a vacuum container;
• a processing chamber disposed in a lower portion of the vacuum container, and which includes a stage disposed in a central region of the lower portion of the processing chamber and on which a sample with a metal film containing a transition metal element is placed;
• a vaporization chamber disposed in an upper portion of the vacuum container and which is configured to vaporize fine droplets of a complexing gas raw material liquid supplied from a vaporizing nozzle unit;
• a path which communicates between the processing chamber and the vaporization chamber above the stage and through which the complexing gas obtained by vaporizing the complexing gas raw material liquid is introduced into the processing chamber and onto a surface of the metal film of the sample;
• and
• a lamp heater unit disposed above the processing chamber and around the path, the lamp heater unit including at least one circular-shaped lamp heater and a transmission window disposed under the at least one of circular-shaped lamp heater through which electromagnetic waves are emitted downward from the at least one circular-shaped lamp heater toward the sample placed on the stage after the complexing gas is introduced onto the metal film of the sample to heat the sample to a predetermined temperature to etch the metal film.