Radical deactivation component, plasma processing apparatus using the same and radical deactivation method

A plasma processing apparatus, comprising:

• a plasma processing chamber;
• at least one instrument:
• first and second pipes disposed between the plasma processing chamber and the at least one instrument, the first pipe having a first conduit, the second pipe having a second conduit, the first conduit being in fluid communication with the plasma processing chamber, the second conduit being in fluid communication with the at least one instrument;
• an O-ring disposed between the first pipe and the second pipe;
• and
• first and second components at least partially disposed in a space surrounded by the O-ring, the first component having a first engagement portion engaged with the first pipe, the second component having a second engagement portion engaged with the second pipe, a path being formed between the first component and the second component, the path being in fluid communication with the first conduit and the second conduit, the path having a first portion, a second portion and at least one turnaround portion, the first portion being in fluid communication with the first conduit, the second portion being in fluid communication with the second conduit, the at least one turnaround portion being disposed between the first portion and the second portion, the first portion and the second portion extending parallel to the first and second pipes, the first portion including an inlet facing the first conduit and without facing the second conduit, the second portion including an outlet facing the second conduit and without facing the first conduit, the at least one turnaround portion being disposed closer to a central axis of the first and second pipes in a radial direction of the first and second pipes than the inlet.