Process window identifier

A computer program product comprising a non-transitory computer-readable medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:

• obtain information regarding an existence of a defect, a probable existence of a defect, or both, in imaging, by a device manufacturing process, each of a plurality of features in an area of interest on a portion of a design layout for imaging by the device manufacturing process onto a substrate under each of a plurality of values of one or more processing parameters of the device manufacturing process;
• and
• determine, based on the information, an overlapping process window (OPW) of the area of interest including one or more of the plurality of features, the OPW, or data derived from the OPW, for configuring an aspect of the device manufacturing process.

A non-transitory computer program product comprising a computer-readable medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:

• obtain information regarding a plurality of overlapping process windows (OPWs) for a patterning device design layout to be processed using a device manufacturing process onto a substrate, each OPW corresponding to a different area of interest spatially distributed across the patterning device design layout;
• and
• produce electronic data representing or using the information regarding the plurality of OPWs for use in configuring an aspect of the device manufacturing process.