Method for manufacturing a micromechanical timepiece part and said micromechanical timepiece part

A micromechanical timepiece part comprising:

• a silicon-based substrate including, on at least one part of a surface of said silicon-based substrate, pores of a depth of at least 10 μm, said pores being closed at one end thereof and open at another end thereof located at the surface, said pores formed along a given direction and separated by one or more flexible pillars, said pores entirely filled with a first material,
• wherein the first material is deposited over said pores filled with said first material and over said pillars to form a surface layer of said first material,
• wherein the silicon-based substrate includes at least one hydrophobic zone and at least another zone, the at least one hydrophobic zone including the pores, the at least another zone not comprising the pores, a tribological agent applied on the at least one hydrophobic zone, and
• wherein the tribological agent is said second material.

A micromechanical timepiece part comprising:

• a silicon-based substrate,
• a hydrophobic zone formed on at least a first part of a surface of said silicon-based substrate and having pores of a depth of at least 10 μm, said pores being closed at one end thereof and open at another end thereof located at the surface, said pores formed along a given direction and separated by one or more pillars having a circular cross section, said pores containing a first material,
• another zone not including the pores formed on at least a second part of a surface of said silicon-based substrate,
• the first material deposited over said pores containing said first material and over said pillars to fill the pores and to form a surface layer of the first material, and
• the first material comprising a tribological agent.