Overlay-shift measurement system
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Ching Lee, Yu-Piao Fang
Life of this patent
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Abstract
Overlay-shift measurement systems are provided. An overlay-shift measurement system includes an optical device, a first light detection device and a processor. The optical device is configured to provide an input light to a metrology target of a semiconductor structure. The first light detection device is configured to receive a transmitted light from the metrology target when the input light penetrates the metrology target. The processor is configured to determine whether overlay-shift between a plurality of first photonic crystals and a plurality of second photonic crystals in the metrology target is present according to characteristics of the transmitted light.
Claims20
An overlay-shift measurement system, comprising:
- an optical device configured to provide an input light to a metrology target of a semiconductor structure;
- a first light detection device configured to receive a transmitted light from the metrology target when the input light penetrates the metrology target;
- a processor configured to determine whether overlay-shift between a plurality of first photonic crystals and a plurality of second photonic crystals in the metrology target is present according to characteristics of the transmitted light;
- and
- a second light detection device configured to receive a reflected light from the metrology target when the input light illuminates the metrology target,
- wherein the processor is configured to determine whether the overlay-shift is present according to the characteristics of both the transmitted light and the reflected light.
An overlay-shift measurement system, comprising:
- an optical device configured to provide an input light to a metrology target of a semiconductor structure;
- a first light detection device configured to receive a reflected light from the metrology target when the input light illuminates the metrology target;
- a processor configured to determine whether overlay-shift between a plurality of first photonic crystals and a plurality of second photonic crystals in the metrology target is present according to characteristics of the reflected light;
- and
- a second light detection device configured to receive a transmitted light from the metrology target when the input light penetrates the metrology target,
- wherein the processor is configured to determine whether the overlay-shift is present according to the characteristics of both the transmitted light and the reflected light,
- wherein the first and second photonic crystals have two heights on the semiconductor structure.
An overlay-shift measurement system, comprising:
- an optical device configured to provide an input light to a metrology target of a semiconductor structure;
- a first light detection device configured to receive a transmitted light from the metrology target when the input light penetrates the metrology target;
- a second light detection device configured to receive a reflected light from the metrology target when the input light illuminates the metrology target;
- and
- a processor configured to determine whether overlay-shift between a plurality of first photonic crystals and a plurality of second photonic crystals in the metrology target is present according to characteristics of the transmitted light and the reflected light,
- wherein the first photonic crystals and the second photonic crystals are formed by different materials.
Dependencies are inferred from the claim text.