Compensating deposition non-uniformities in circuit elements
AssigneeGoogle Inc.
InventorsBrian James Burkett, Rami Barends
Life of this patent
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Abstract
A method of fabricating a circuit element, such as a quantum computing circuit element, including obtaining a lithography mask write file that includes mask information characterizing one or more mask features, obtaining a uniformity function that is configured to modify the mask information to compensate for a non-uniform deposition process, applying the uniformity function to the lithography mask write to obtain a modified lithography mask write file, and performing lithography as directed by the modified lithography mask write file.
Claims19
A computer-implemented method of fabricating a circuit element comprising:
- receiving a first lithography mask write file comprising mask information characterizing at least one mask feature;
- generating a uniformity function configured to modify the mask information characterizing the at least one mask feature to compensate for a non-uniform deposition process,
- wherein generating the uniformity function comprises:
- (a) deriving one or more geometric arguments that determine a geometric relationship between a set of one or more deposition parameters and a resulting effect the deposition parameter has on a deposition,
- (b) deriving, from a calibration process, an empirical function that characterizes how deposition data varies as a function of the set of one or more deposition parameters,
- or (c) a combination of (a) and (b);
- applying the uniformity function to the first lithography mask write file to obtain a first modified lithography mask write file;
- and
- providing the first modified lithography mask write file.
A system comprising:
- a data processing apparatus;
- a non-transitory memory storage in data communication with the data processing apparatus and storing instructions executable by the data processing apparatus and that upon such execution cause the data processing apparatus to perform operations comprising:
- receiving a first lithography mask write file comprising mask information characterizing at least one mask feature;
- generating a uniformity function configured to modify the mask information characterizing the at least one mask feature to compensate for a non-uniform deposition process,
- wherein generating the uniformity function comprises:
- (a) deriving one or more geometric arguments that determine a geometric relationship between a set of one or more deposition parameters and a resulting effect the deposition parameter has on a deposition,
- (b) deriving, from a calibration process, an empirical function that characterizes how deposition data varies as a function of the set of one or more deposition parameters,
- or (c) a combination of (a) and (b);
- applying the uniformity function to the first lithography mask write file to obtain a first modified lithography mask write file;
- and
- providing the first modified lithography mask write file.
A non-transitory computer readable medium storing instructions which, when executed by data processing apparatus, causes it to perform operations comprising:
- receiving a first lithography mask write file comprising mask information characterizing at least one mask feature;
- generating a uniformity function configured to modify the mask information characterizing the at least one mask feature to compensate for a non-uniform deposition process,
- wherein generating the uniformity function comprises:
- (a) deriving one or more geometric arguments that determine a geometric relationship between a set of one or more deposition parameters and a resulting effect the deposition parameter has on a deposition,
- (b) deriving, from a calibration process, an empirical function that characterizes how deposition data varies as a function of the set of one or more deposition parameters,
- or (c) a combination of (a) and (b);
- applying the uniformity function to the first lithography mask write file to obtain a first modified lithography mask write file;
- and
- providing the first modified lithography mask write file.
Dependencies are inferred from the claim text.