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US 11,378,739 B2Granted
Fabricating photonics structure light signal transmission regions
AssigneeThe Research Foundation for The State University of New York
InventorsDouglas Coolbaugh, Gerald L. Leake, Jr.
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Abstract
There is set forth herein a method including depositing a layer formed of barrier material over a conductive material formation of a photonics structure; and removing material of the layer in a light signal transmitting region of the photonics structure. In one embodiment the barrier material can include silicon carbon nitride. In one embodiment the barrier material can include silicon nitride.
Claims20
A method comprising:
- depositing a barrier layer that includes a first portion extending through a light signal transmitting region of a photonics structure, and a second portion formed on a conductive material formation, wherein the first portion extending through the light signal transmitting region is formed on a dielectric stack;
- removing the first portion of the barrier layer formed on the dielectric stack to expose the dielectric stack within the light signal transmitting region;
- depositing a layer of cladding dielectric material so that a portion of the layer of cladding dielectric material is formed on the barrier layer and a portion of the layer of cladding dielectric material is formed on the exposed portion of the dielectric stack formed within the light signal transmitting region;
- and
- planarizing the layer of cladding dielectric material so that a top surface of the cladding dielectric material extends in a horizontal plane.
2 more elements
Dependencies are inferred from the claim text.