Coating processing apparatus, coating processing method, and storage medium

A coating processing apparatus comprising:

• a substrate holder that holds a substrate;
• an elongated nozzle including a slit-shaped ejecting port that ejects a coating liquid containing an optical material to the substrate held by the substrate holder to apply the coating liquid to the substrate;
• a moving mechanism including a substrate mover and a nozzle mover that relatively moves the substrate holder and the elongated nozzle, respectively, in an orthogonal direction;
• and
• a controller that controls the moving mechanism,
• wherein the controller is configured to control a coating direction of the coating liquid applied to the substrate by controlling a relative moving speed of the substrate holder and the elongated nozzle,
• the elongated nozzle is provided in a state of being fixed,
• the controller is configured to control the moving mechanism to move the substrate holder in the one direction, and, at the same time, move the substrate holder in a direction orthogonal to the one direction from a first position to a second position across the elongated nozzle while the coating liquid is ejected from the elongated nozzle, so as to move the substrate in a direction inclined with respect to the one direction and the orthogonal direction thereof to apply the coating liquid in a direction inclined with respect to the substrate held by the substrate holder, and
• wherein the slit-shaped ejecting port extends in the one direction for a distance longer than a moving range of the substrate between the first position and the second position in the one direction.

A coating processing method comprising:

• ejecting a coating liquid containing an optical material from a slit-shaped ejecting port of an elongated nozzle while relatively moving a substrate holder that holds a substrate and the elongated nozzle in an orthogonal direction with respect to each other to apply the coating liquid to the substrate;
• and
• moving the substrate holder in one direction from a first position to a second position, and at the same time, moving the elongated nozzle in a direction orthogonal to the one direction while the coating liquid is ejected from a slit-shaped ejecting port of the elongated nozzle, while controlling a relative moving speed of the substrate holder and the elongated nozzle, so as to apply the coating liquid in a direction inclined with respect to the substrate held by the substrate holder,
• wherein the slit-shaped ejecting port extends in the one direction for a distance longer than a moving range of the substrate between the first position and the second position in the one direction.