Optical film structures and articles for hidden displays and display devices

An article for a display device, comprising:

• a translucent substrate comprising opposing major surfaces;
• and
• an optical film structure disposed on a first major surface of the translucent substrate, the optical film structure comprising an outer surface opposing the first major surface and a plurality of periods such that each period comprises an alternating low refractive index layer and high refractive index layer,
• wherein each high refractive index layer has a refractive index of greater than 1.9 and each low refractive index layer has a refractive index of less than 1.7,
• wherein the article exhibits a hardness of 10 GPa or greater measured from the outer surface of the optical film structure along an indentation depth of about 100 nm, the hardness measured by a Berkovich Indenter Hardness Test,
• wherein the article exhibits a single side average photopic light reflectance of at least 50% of non-polarized light as measured at the outer surface from near-normal incidence to an incident angle of 60 degrees over a plurality of portions of the visible spectrum from 400 nm to 700 nm, wherein each portion is at least 10 nm in width,
• wherein the article further exhibits a single side average photopic reflectance of greater than 30% of s-polarized light emitted from the display device at incident angles from 40 degrees to 60 degrees over a plurality of portions of the visible spectrum from 400 nm to 700 nm, wherein each portion is at least 10 nm in width,
• wherein the plurality of periods is at least ten (10) periods, and
• further wherein each low refractive index layer comprises SiO2 or doped-SiO2 and each high refractive index layer comprises AlOxNy, SiOxNy, SiuAlvOxNy, SiNx or ZrO2.