Film-forming device

A film-forming device comprising:

• a chamber capable of maintaining vacuum therein;
• a workpiece holder that is constructed to align and hold workpieces to be processed in multiple stages such that main surfaces of the workpieces are oriented in a vertical direction relative to a central axis of the chamber;
• a deposition material supply pipe positioned to supply a deposition material into the chamber;
• a modifier supply pipe positioned to supply a modifier into the chamber;
• a carrier gas supply pipe positioned to supply a first carrier gas into the chamber;
• and
• an exhaust mechanism that exhausts gas from the chamber,
• wherein in a cross section of the chamber in a direction parallel to the main surfaces of the workpieces, the exhaust mechanism is located on a side of the deposition material supply pipe, the modifier supply pipe, and the carrier gas supply pipe that is opposite to an opening direction of gas outlets of the deposition material supply pipe, the modifier supply pipe, and the carrier gas supply pipe, and a total gas flow from the deposition material supply pipe, the modifier supply pipe, and the carrier gas supply pipe is symmetric about a centerline of the chamber parallel to the vertical direction of the main surfaces of the workpieces.