Polishing apparatus
AssigneeKioxia Corporation
InventorsSyunichi Ono, Tsutomu Miki
Life of this patent
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AssigneeKioxia Corporation
InventorsSyunichi Ono, Tsutomu Miki
Estimating the term…
A polishing apparatus includes a polisher that polishes a target object to be polished. A holder is rotatable while holding the target object to be polished. Multiple concentric elastic members around the center of a rotation shaft of the holder are provided on the holder and elastically press the target object to be polished against the polisher. Multiple sensors are provided in the elastic members and detect vibration from a polishing surface of the target object to be polished. The detected vibration allows the polishing apparatus to create an unevenness map of the polishing surface and correspondingly actuate the concentric elastic members to remove the unevenness, according to a control sequence set in advance, based on the detected vibration, in a polishing control program to control the concentric elastic members.
A polishing apparatus comprising:
A polishing method using a polishing apparatus that includes a polisher configured to polish a surface of a target object to be polished;
A polishing system for polishing a target surface, the polishing system comprising:
Dependencies are inferred from the claim text.