Method of identifying trajectory of eddy current sensor, method of calculating substrate polishing progress, method of stopping operation of substrate polishing apparatus, method of regularizing substrate polishing progress, program for executing the same, and non-transitory recording medium that records program

A method for identifying a trajectory of an eddy current sensor as seen from a substrate in a substrate polishing apparatus, wherein

• the substrate polishing apparatus comprises:
• a polishing table provided with the eddy current sensor and configured to be rotatable;
• and
• a polishing head positioned to face the polishing table and configured to be rotatable, the substrate being installable on a surface facing the polishing table, and
• the method comprises:
• obtaining a sensor output map that is a map representing an output signal of the eddy current sensor for a whole surface to be polished of the substrate as three-dimensional data;
• polishing the substrate by pressing the substrate to the polishing table while rotating the polishing head installed with the substrate and the polishing table;
• obtaining a profile of a real-time polishing signal that is a signal output from the eddy current sensor during polishing of the substrate as two-dimensional data;
• and
• extracting a trajectory having a profile most similar to the profile of the real-time polishing signal as two dimensional data from the sensor output map as three-dimensional data and identifying the extracted trajectory as a trajectory of the eddy current sensor as seen from the substrate.