Recording head with focusing structure

A method, comprising:

• forming a patterned first hard mask comprising a plurality of layers;
• removing at least one layer of the first hard mask to expose a layer of tantalum nitride having first and second portions on opposing sides of a patterned line structure, wherein the line structure has a first end having a first width and a second end having a second width, smaller than the first width, and the second width is consistent along at least a third of the length of the line structure;
• forming a second hard mask on the exposed layer, wherein the second hard mask is patterned to include an opening over the first and second portions adjacent the line structure and a parabolic-shaped extension into the opening overlapping the second end of the line structure;
• removing the second hard mask and regions of the first and second portions exposed through the opening in the second hard mask;
• depositing optically reflective material in the regions of the first and second portions to form first and second reflectors of a subwavelength-sized focusing mirror, each of the first and second reflectors having a curved edge coupled to a straight edge, wherein the straight edges are spaced apart from each other by a distance of the second width.