Method and apparatus for manufacturing microfluidic chip with femtosecond plasma grating

An apparatus for manufacturing a microfluidic chip with a femtosecond plasma grating, wherein the apparatus comprises a plasma grating optical path, a microchannel processing platform, and a hydrofluoric acid ultrasonic cell;

• the plasma grating optical path comprises a femtosecond pulse laser, an optical splitter, a first time domain delay controller, a second time domain delay controller, a first reflected laser beam, a second reflected laser beam, a transmitted laser beam, a first displacement platform, a second displacement platform, a first plano-convex cylindrical lens, a second plano-convex cylindrical lens, a first diaphragm, a second diaphragm, a plano-convex circular lens, and a plurality of planar mirrors;
• the microchannel processing platform comprises quartz glass, a three-dimensional electronically controlled displacement platform, a first convex lens, a second convex lens, a third convex lens, a fourth convex lens, a first CCD camera, and a second CCD camera;
• the optical splitter is configured as a combination of a half-wavelength wave plate and a polarization beam splitter, or as a microarray mirror, a single planar beam splitter, or a plurality of planar beam splitters;
• the first time domain delay controller comprises a fourth planar mirror, a fifth planar mirror, and the first displacement platform, and is configured to control an optical path difference between the reflected laser beam and the transmitted laser beam;
• the second time domain delay controller comprises a ninth planar mirror, a tenth planar mirror and the second displacement platform, and is configured to control an optical path difference between the reflected laser beam and the transmitted laser beam;
• and
• the first and second diaphragms are rectangular or circular, and configured to constrain a size of a light spot passing through the diaphragms and control a number and distribution of optical filaments in the plasma grating.