# US 11,359,280 B2 · Apparatus and method for processing, coating or curing a substrate

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- Number: US 11,359,280 B2
- Document ID: US11359280B2
- Status: Granted
- Kind: B2
- Application number: 16/651,669
- Filed: 2018-09-27
- Published: 2020-08-20
- Granted: 2022-06-14
- Earliest claimed: 2017-09-29
- Assignees: CAMVAC Limited
- Applicants: Camvac Limited
- Inventors: Alexander John Topping; James Tiw Shipman; Robert William Jarman
- Web page: https://patentgrep.com/patent/US11359280B2

## CPC

- C23C 16/45536: {Use of plasma, radiation or electromagnetic fields}
- H01J 37/345: {Magnet arrangements in particular for cathodic sputtering apparatus (material of magnets or magnets in general H01F1/00, H01F7/00)}
- B05D 3/147: {Curing}
- C23C 14/35: by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)}
- C23C 14/351: {using a magnetic field in close vicinity to the substrate}
- C23C 16/50: using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)}
- C23C 16/545: {for coating elongated substrates}
- H01J 37/32669: {Particular magnets or magnet arrangements for controlling the discharge}
- H01J 37/32761: {Continuous moving}
- H01J 37/3405: {Magnetron sputtering}
- H01J 37/3408: {Planar magnetron sputtering}
- H01J 37/3452: {Magnet distribution}
- B05D 3/207: {post-treatment by magnetic fields}
- B05D 2252/02: of indefinite length
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)
- B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02)

## Abstract

An apparatus for processing or curing a substrate, the apparatus comprising: a support (102) arranged to transport a moving flexible substrate (104), a plasma generator (110) arranged to generate plasma (112), a magnet array (114) arranged to spatially define the plasma, wherein the magnet array comprises: a first elongate magnet (404) having a first polarity; a second elongate magnet (406), substantially parallel to the first elongate magnet, having a second polarity, opposite to the first polarity, such that the first and second elongate magnets define a first straight magnetic flux portion (204); a third elongate magnet (408), substantially parallel to the first elongate magnet, having the first polarity, such that the second and third elongate magnets define a second straight magnetic flux portion, connected to the first straight magnetic flux portion by a first curved magnetic flux portion (206); a fourth elongate magnet (410), substantially parallel to the first elongate magnet, having the second polarity, such that the third and fourth elongate magnets define a third straight magnetic flux portion, connected to the second straight magnetic flux portion by a second curved magnetic flux portion.

## Claims

### Claim 1

An apparatus for processing, curing or coating a substrate, the apparatus comprising:
a plasma generator arranged to generate plasma; and
a magnet array arranged to spatially define the plasma to form a closed loop plasma racetrack, the magnet array comprising a plurality of elongate magnets arranged in a parallel relationship with alternating polarities, with each elongate magnet having a first end defining a passage region where flux extends around the first end of the magnet and a second end defining a blocking region which inhibits flux extending around the second end of the magnet so as to define a serpentine closed loop plasma racetrack,
wherein the substrate is flexible and the apparatus further comprises a cylindrical drum having an inner circumferential surface and an outer circumferential surface and the drum is arranged and configured to rotate to transport the flexible substrate on the outer circumferential surface, and
wherein the magnet array is arranged and configured such that the serpentine, closed loop plasma racetrack extends 360 degrees around the drum with the drum disposed between the magnet array and the serpentine, closed loop plasma racetrack.

### Claim 2 (depends on 1)

An apparatus according to claim 1 wherein the magnet array comprises:
a first elongate magnet having a first polarity;
a second elongate magnet, positioned adjacent and substantially parallel to the first elongate magnet, having a second polarity opposite to the first polarity, such that the first and second elongate magnets define a first straight magnetic flux portion between them;
a third elongate magnet having a first end and a second end, the third magnet being positioned adjacent and substantially parallel to the second elongate magnet, having the first polarity, such that the second and third elongate magnets define a second straight magnetic flux portion between them, the second straight magnetic flux portion being connected to the first straight magnetic flux portion by a first curved magnetic flux portion which extends around the first end of the second elongate magnet; and
a fourth elongate magnet positioned adjacent and substantially parallel to the third elongate magnet, the fourth elongate magnet having a first end and a second end, the first end being adjacent to the second end of the third elongate magnet, the fourth elongate magnet having the second polarity, such that the third and fourth elongate magnets define a third straight magnetic flux portion between them, the third straight magnetic flux portion being connected to the second straight magnetic flux portion by a second curved magnetic flux portion which extends around the first end of the third elongate magnet.

### Claim 3 (depends on 1)

An apparatus according to claim 1 wherein each of the elongate magnets is formed from a plurality of individual magnets.

### Claim 4 (depends on 2)

An apparatus according to claim 2 wherein the center of the first elongate magnet is aligned with the center of the third elongate magnet and the center of the second elongate magnet is aligned with the center of the fourth elongate magnet, and wherein the centers of the first and third elongate magnets are offset with respect to the centers of the second and fourth elongate magnets.

### Claim 5 (depends on 2)

An apparatus according to claim 2 wherein the magnet array further comprises one or more turning magnets located at one or both ends of each elongate magnet, wherein the turning magnets have the same polarity but a different orientation from the orientation of the elongate magnets.

### Claim 6 (depends on 5)

An apparatus according to claim 5 wherein first and third turning magnets are located at a first end of the first and third elongate magnets respectively and second and fourth turning magnets are located at a second end of the second and fourth elongate magnets, wherein the second end is opposite to the first end, and wherein the turning magnets have an orientation that is perpendicular to the orientation of the elongate magnets.

### Claim 7 (depends on 6)

An apparatus according to claim 6 wherein the center of each turning magnet is aligned with the longitudinal axis of each corresponding elongate magnet.

### Claim 8 (depends on 6)

An apparatus according to claim 6 wherein one end of each of the turning magnets is aligned with the longitudinal axis of each corresponding elongate magnet.

### Claim 9 (depends on 6)

An apparatus according to claim 6 wherein the first turning magnet is in contact with the third turning magnet and the second turning magnet is in contact with the fourth turning magnet.

### Claim 10 (depends on 5)

An apparatus according to claim 5 wherein the elongate magnets and turning magnets of the magnet array are arranged into a staggered or zigzag formation.

### Claim 11 (depends on 5)

An apparatus according to claim 5 wherein
a turning magnet is located at one end of each of the elongate magnets, wherein the turning magnets are oriented at 45° to the elongate magnets and are located at alternate ends of each of the elongate magnets.

### Claim 12 (depends on 1)

An apparatus according to claim 1, wherein the magnet array is located within the drum and disposed around the inner circumferential surface and arranged and configured such that the serpentine, closed loop plasma racetrack extends 360 degrees around the outer circumferential surface.

### Claim 13 (depends on 1)

An apparatus according to claim 1, wherein the magnet array is arranged and configured such that the serpentine, closed loop plasma racetrack comprises a plurality of parallel racetrack portions each extending across the outer circumferential surface of the drum, each pair of adjacent racetrack portions being connected by a single turning region which extends around the circumferential surface of the drum, wherein the parallel offset distance between each racetrack portion of the serpentine, closed loop plasma racetrack is equal.

### Claim 14 (depends on 1)

An apparatus according to claim 1, wherein the drum has a first axial end and a second axial end and wherein all elongate magnets of a first polarity have passage regions closer to the first axial end than the second axial end and blocking regions closer to the second axial end than the first axial end and all elongate magnets of a second polarity have passage regions closer to the second axial end than the first axial end and blocking regions closer to the first axial end than the second axial end.