Treatment method and cleaning method for metal oxyfluorides
AssigneeCentral Glass Company, Limited
InventorsMasakiyo Nagatomo, Akifumi Yao
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Abstract
A treatment method according to the present invention includes bringing a metal oxyfluoride of the general formula: MO(6-x)/2Fx (where 0<x<6; and M=W or Mo) into contact with a fluorine-containing gas at a reaction temperature higher than or equal to 0° C. and lower than 400° C., thereby converting the metal oxyfluoride to a metal hexafluoride of the general formula: MF6 (where M=W or Mo). This treatment method enables conversion of the metal oxyfluoride to the high vapor pressure compound without the use of a plasma generator and can be applied to cleaning of a metal fluoride production apparatus or cleaning of a film forming apparatus.
Claims11
A treatment method for a metal oxyfluoride, comprising bringing a metal oxyfluoride of the general formula:
- MO(6-x)/2Fx (where 0<x<6;
- and M=W or Mo) into contact with at least one kind of fluorine-containing gas selected from the group consisting of F2 gas, NF3 gas, ClF3 gas, and IF7 gas at a reaction temperature ranging from 10° C. to 200° C., thereby converting the metal oxyfluoride to a metal hexafluoride of the general formula:
- MF6 (where M=W or Mo).
Dependencies are inferred from the claim text.