Charged particle beam device
AssigneeHitachi High-Tech Corporation
InventorsAnoru Suga, Shuhei Yabu, Kazuki Ishizawa, Michio Hatano
Life of this patent
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Abstract
An objective of the present invention is to provide a charged particle beam device capable of estimating a lifetime of a filament of a charged particle beam source with a cheap and simple circuit configuration. The charged particle beam device according to the present invention includes a boosting circuit that boosts a voltage to be supplied to a filament and estimates a remaining duration of the filament using a measured value of a current flowing on a low-voltage side of the boosting circuit (see FIG. 3).
Claims11
A charged particle beam device that radiates a charged particle beam to a sample, the device comprising:
- a charged particle beam source configured to radiate the charged particle beam from a filament;
- a boosting circuit configured to boost a voltage to be supplied to the filament;
- and
- a control unit configured to estimate a remaining duration in which the filament is normally usable,
- wherein the boosting circuit includes a low-voltage side circuit in which a first current flows and a high-voltage side circuit in which a second current flows,
- wherein the boosting circuit boosts a first voltage applied to the low-voltage side circuit to a second voltage applied to the high-voltage side circuit and applies the second voltage to the filament, and
- wherein the control unit estimates the remaining duration using a measured value of the first current or a measured value of the first voltage.
Dependencies are inferred from the claim text.