Metal-containing onium salt compound, photodegradable base, resist composition, and method for manufacturing device using said resist composition
AssigneeToyo Gosei Co., Ltd.
InventorsMichiya Naito, Masamichi Hayakawa, Yoshiyuki Utsumi
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Abstract
A metal-containing onium salt compound suitable for use as a photodegradable base of a resist composition and a resist composition using the metal-containing onium salt compound are provided, the resist composition having excellent sensitivity to ionizing radiation such as extreme ultraviolet (EUV), excellent resolution and focal depth in lithography, and can reduce line width roughness (LWR) in a fine pattern. The onium salt compound including a specific metal is used as the photodegradable base.
Claims10
A metal-containing onium salt compound represented by the following Formula (1),
- (R13M-Ar1—Y+R2)nX− (1)
- wherein in the above Formula (1):
- each of R1 and R2 is independently an alkyl group having 1 to 20 carbon atoms or an aryl group having 5 to 20 carbon atoms, where a part or all of hydrogen atoms of the alkyl group and the aryl group may be substituted;
- Ar1 is an arylene group having 5 to 20 carbon atoms, where a part or all of hydrogen atoms of the arylene group may be substituted;
- the alkyl group may contain a hetero atom-containing group instead of at least one methylene group thereof, and the aryl group and the arylene group may contain a hetero atom instead of at least one carbon atom in ring structure thereof;
- M is;
- Y is any one selected from the group consisting of an iodine atom, a sulfur atom, a selenium atom and a tellurium atom;
- n is 1 when Y is the iodine atom, and n is 2 when Y is any one selected from the group consisting of the sulfur atom, the selenium atom and the tellurium atom;
- any two or more of Ar1 and two R2 may be bonded to each other to form a ring structure with Y bonded thereto, and the ring structure may contain a hetero atom;
- and
- X− is an anion.
Dependencies are inferred from the claim text.