Systems and methods for continuously supplying negative ions using multi-pulsed plasma sources
AssigneeKorea Atomic Energy Research Institute
InventorSungryul Huh
Life of this patent
Estimating the term…
Loading patent…
AssigneeKorea Atomic Energy Research Institute
InventorSungryul Huh
Estimating the term…
The present disclosure relates to a system and method for continuously supplying negative ions using multi-pulsed plasma sources. The system includes a plurality of plasma generators each to generate plasma by applying pulsed power to the electronegative gas from a gas source; a negative ion supply unit connected to the plasma generators to receive the plasmas transferred therefrom and to continuously supply ions; and a controller connected to the plurality of plasma generators and configured to control characteristics of the pulsed powers delivered to the respective plasma generators and to adjust phase shift associated with the pulsed power envelopes. By adjusting the phase shift, the controller enables a plasma in one of the plasma generators to be in an after-glow state when a plasma in another plasma generator is in an active-glow state.
A system for supplying negative ions using multi-pulsed plasma sources, the system comprising:
A method for supplying negative ions using multi-pulsed plasma sources, the method comprising:
Dependencies are inferred from the claim text.