Charged particle beam device

A charged particle beam device including an electrostatic chuck mechanism, the charged particle beam device comprising:

• a stage which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam;
• a ceramic which is supported by a first support member at a first position on the stage and constitutes a dielectric layer of the electrostatic chuck;
• and
• a ring-shaped electrode which is supported by a second support member at a second position different from the first position on the stage and encloses the surroundings of the sample, and to which a predetermined voltage is applied, wherein
• the ring-shaped electrode is made of a mixture of aluminum and metal silicon.

A charged particle beam device including an electrostatic chuck mechanism, the charged particle beam device comprising:

• a stage which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam;
• a ceramic which is supported by a first support member at a first position on the stage and constitutes a dielectric layer of the electrostatic chuck;
• and
• a ring-shaped electrode which is supported by a second support member at a second position different from the first position on the stage and encloses the surroundings of the sample, and to which a predetermined voltage is applied, wherein
• the ring-shaped electrode is subjected to metal plating.