Thermal spraying method of component for plasma processing apparatus and component for plasma processing apparatus
AssigneeTokyo Electron Limited
InventorYoshiyuki Kobayashi
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AssigneeTokyo Electron Limited
InventorYoshiyuki Kobayashi
Estimating the term…
There is provision of a thermal spraying method of a component for a plasma processing apparatus performed by a plasma spraying apparatus including a nozzle and a plasma generating unit having a common axis with the nozzle. The method includes a step of injecting, with a plasma generating gas, feedstock powder having a particle diameter of 15 μm or less from a tip of the nozzle to the plasma generating unit, a step of generating a plasma from the plasma generating gas in the plasma generating unit, by using electric power not more than 50 kW, and a step of thermal spraying the feedstock powder liquefied by the plasma at the component through a mask, such that a surface of a resin layer of the component is covered with the feedstock powder.
A method of thermal spraying a component for a plasma processing apparatus performed by a plasma spraying apparatus including a nozzle and a plasma generating unit having a common axis with the nozzle, the plasma generating unit including a plurality of gas supply paths configured to supply, into the plasma generating unit, Ar gas in a direction perpendicular to the nozzle, in order to generate a rotational flow in the plasma generating unit, the method comprising:
A method of thermal spraying a component for a plasma processing apparatus performed by a plasma spraying apparatus including a nozzle and a plasma generating unit having a common axis with the nozzle, the plasma generating unit including a plurality of gas supply paths configured to supply, into the plasma generating unit, Ar gas in a direction perpendicular to the nozzle, in order to generate a rotational flow in the plasma generating unit, the method comprising:
A method of thermal spraying a component for a plasma processing apparatus performed by a plasma spraying apparatus including a nozzle and a plasma generating unit having a common axis with the nozzle, the plasma generating unit including a plurality of gas supply paths configured to supply, into the plasma generating unit, Ar gas in a direction perpendicular to the nozzle, in order to generate a rotational flow in the plasma generating unit, the method comprising:
Dependencies are inferred from the claim text.