Manufacturing method of display substrate, display substrate and display device
AssigneeBoe Technology Group Co., Ltd.
InventorsJiangnan Lu, Shi Shu, Kang Guo, Qi Yao
Life of this patent
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Abstract
Provided are a manufacturing method of a display substrate, a display substrate and a display device, which belongs to the field of display technologies. The manufacturing method of the display substrate includes: forming a first planarization layer on a base substrate on which a patterned film layer is formed; forming a first buffer layer on the side, away from the base substrate, of the first planarization layer; forming a second buffer layer on the side, away from the base substrate, of the first buffer layer; and forming a Wire Grid Polarizer (WGP) on the side, away from the base substrate, of the second buffer layer.
Claims17
A manufacturing method of a display substrate, comprising:
- forming a first planarization layer on a base substrate on which a patterned film layer is formed;
- forming a first buffer layer on a side, away from the base substrate, of the first planarization layer;
- forming a second buffer layer on a side, away from the base substrate, of the first buffer layer;
- and
- forming a Wire Grid Polarizer (WGP) on a side, away from the base substrate, of the second buffer layer;
- and
- wherein prior to forming the first buffer layer on the side, away from the base substrate, of the first planarization layer, the method further comprises:
- forming a second planarization layer on the side, away from the base substrate, of the first planarization layer, wherein the second planarization layer and the first planarization layer are made from different materials;
- and
- wherein after forming the second planarization layer on the side, away from the base substrate, of the first planarization layer, the method further comprises:
- performing ashing on a side, away from the base substrate, of the second planarization layer to reduce a contact angle between the second planarization layer and the first buffer layer.
A display substrate, comprising:
- a patterned film layer on a base substrate and a first planarization layer on a side, away from the base substrate, of the patterned film layer;
- a first buffer layer on a side, away from the base substrate, of the first planarization layer;
- a second buffer layer on a side, away from the base substrate, of the first buffer layer;
- a Wire Grid Polarizer (WGP) on a side, away from the base substrate, of the second buffer layer;
- and
- a second planarization layer between the first planarization layer and the first buffer layer, wherein the second planarization layer and the first planarization layer are made from different materials;
- and
- wherein the second planarization layer is subjected to an ashing process, and a contact angle between the second planarization layer and the first buffer layer is reduced.
A display device, comprising a display substrate, wherein the display substrate comprises:
- a patterned film layer on a base substrate and a first planarization layer on a side, away from the base substrate, of the patterned film layer;
- a first buffer layer on a side, away from the base substrate, of the first planarization layer;
- a second buffer layer on a side, away from the base substrate, of the first buffer layer;
- and
- a Wire Grid Polarizer (WGP) on a side, away from the base substrate, of the second buffer layer;
- and
- a second planarization layer between the first planarization layer and the first buffer layer, wherein the second planarization layer and the first planarization layer are made from different materials;
- and
- wherein the second planarization layer is subjected to an ashing process, and a contact angle between the second planarization layer and the first buffer layer is reduced.
Dependencies are inferred from the claim text.