Process for the generation of metal-containing films
AssigneesBASF SE, Wayne State University
InventorsDavid Dominique Schweinfurth, Lukas Mayr, Sinja Verena Klenk, Sabine Weiguny, Charles Hartger Winter, Kyle Blakeney, Nilanka Weerathunga Sirikkathuge, Tharindu Malawara Arachchige Nimanthaka Karunaratne
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Abstract
A process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state where A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group, E is NR or O, n is 0, 1 or 2, m is 0, 1 or 2, and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.
Claims13
A process for preparing inorganic metal-containing films comprising bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state
- wherein A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,
- E is NR or O,
- n is 0, 1 or 2, m is 0, 1 or 2, and
- R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.
A compound of general formula (I), (II), (III), or (IV)
- wherein A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,
- E is NR or O,
- n is 0, 1 or 2, m is 0, 1 or 2, and
- R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group wherein at least one E or A contains oxygen or n is 2 or m is 2.
Dependencies are inferred from the claim text.