Method for stabilizing chlorosilane polymer
AssigneeIHI Corporation
InventorsYasutomo Tanaka, Yuuta Ootsuka, Wataru Kubota, Masato Ishizaki, Kozue Akazaki
Life of this patent
Estimating the term…
Abstract
This disclosure is to make it possible to easily stabilize a chlorosilane polymer while preventing a solid chlorosilane polymer from being generated. Disclosed is a method for stabilizing a chlorosilane polymer generated secondarily in a step of a chemical vapor deposition method using chlorosilane-based gas, the method including: a step of bringing alcohol into contact with the chlorosilane polymer, degrading the chlorosilane polymer to alkoxide, hydrogen chloride and hydrogen, and diluting the degraded alkoxide with the alcohol; and a step of performing hydrolysis for the alkoxide.
Claims6
A method for degrading a chlorosilane polymer generated secondarily in a step of a chemical vapor deposition method using chlorosilane-based gas, the method comprising:
- a step of bringing ethanol, allowing containing 10% or less of impurities including water, into contact with the chlorosilane polymer, degrading the chlorosilane polymer to alkoxide, hydrogen chloride and hydrogen, and diluting the degraded alkoxide, hydrogen chloride and hydrogen with the ethanol;
- and
- a step of performing hydrolysis for the alkoxide by pouring the ethanol containing the diluted alkoxide into water.
Dependencies are inferred from the claim text.