Apparatus and method for contamination identification
AssigneeBruker Nano, Inc.
InventorsJeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley, Alexander M. Figliolini
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Abstract
Method and apparatus for identifying a contaminant on a substrate. Identification of a contaminant removed from a substrate can be useful in identifying and eliminating or reducing the source of the contamination and tailoring the removal method to minimize the potential for substrate damage. The methods and apparatus for identification of the contaminant provide liberation of molecules of the contaminant from the surface of the substrate, accounting for different geometries and substrate materials, sample preparation, and chemical analysis of the contaminant.
Claims13
A method of analyzing contaminants on the surface of a photomask, comprising the steps of:
- directing electromagnetic waves toward the photomask having a contaminating particulate disposed thereon, the electromagnetic waves having a wavelength that is substantially the same as a local maximum of the absorption spectrum of the photomask;
- generating a first temperature increase in the photomask with the electromagnetic waves;
- inducing a second temperature increase in the contaminant due to the first temperature increase in the photomask;
- producing a thermal decomposition of the contaminant from the surface of the photomask;
- and
- analyzing the composition of the contaminant.
A method of mitigating the effects of contaminants on the surface of a substrate, comprising the steps of:
- directing electromagnetic waves toward the substrate having a contaminating particulate disposed thereon, the electromagnetic waves having a wavelength that is substantially the same as a local maximum of the absorption spectrum of the substrate;
- generating a first temperature increase in the substrate with the electromagnetic waves;
- inducing a second temperature increase in the contaminant due to the first temperature increase in the substrate;
- producing a thermal decomposition of the contaminating particulate from the surface of the substrate;
- and
- analyzing the contaminating particulate.
Dependencies are inferred from the claim text.