# US 11,309,358 B2 · Display substrate and manufacturing method thereof

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- Number: US 11,309,358 B2
- Document ID: US11309358B2
- Status: Granted
- Kind: B2
- Application number: 16/063,924
- Filed: 2017-07-03
- Published: 2021-07-01
- Granted: 2022-04-19
- Earliest claimed: 2016-12-27
- Assignees: Boe Technology Group Co., Ltd.; Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Applicants: Boe Technology Group Co., Ltd.; Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Inventors: Shengping Du; Tongshang Su; Zhengfeng Huang; Yu Yang; Yun Ma; Wen Guo; Lihua Liu
- Web page: https://patentgrep.com/patent/US11309358B2

## CPC

- G02F 1/136222: {Colour filters incorporated in the active matrix substrate}
- G02F 1/136227: {Through-hole connection of the pixel electrode to the active element through an insulation layer}
- G02F 1/1368: in which the switching element is a three-electrode device {(G02F1/136277 takes precedence)}
- H10D 86/021: {of multiple TFTs}
- H10D 86/451: {characterised by the compositions or shapes of the interlayer dielectrics}
- H10D 86/60: wherein the TFTs are in active matrices
- H10K 59/1201: {Manufacture or treatment}
- H10K 59/121: characterised by the geometry or disposition of pixel elements
- H10K 59/122: Pixel-defining structures or layers, e.g. banks
- H10K 59/38: comprising colour filters or colour changing media [CCM]
- H10K 71/00: Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K 71/166: {using selective deposition, e.g. using a mask}
- H10K 71/20: Changing the shape of the active layer in the devices, e.g. patterning
- G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES

## Abstract

A display substrate and a manufacturing method thereof are disclosed. The display substrate is divided to have a non-pixel region and a color pixel region. The manufacturing method includes: forming a thin film transistor (TFT) on a base substrate in the non-pixel region; forming a passivation layer on the TFT; forming a color filter on the passivation layer in the color Pixel region; forming a planarization layer on the passivation layer and the color filter; thinning a thickness of a portion of the planarization layer located in the color pixel region; and forming a display electrode on the planarization layer and connecting the display electrode to a drain electrode of the TFT through a via hole.

## Claims

### Claim 1

A manufacturing method of a display substrate, the display substrate being divided to have a non-pixel region and a color pixel region, the manufacturing method of the display substrate comprising:
forming a thin film transistor (TFT) on a base substrate in the non-pixel region;
forming a passivation layer on the TFT;
forming a color filter on the passivation layer in the color pixel region;
forming a planarization layer on the passivation layer and the color filter;
thinning a thickness of a portion of the planarization layer located in the color pixel region so that the thickness of the portion of the planarization layer located in the color pixel region is smaller than a thickness of a portion of the planarization layer located in the non-pixel region, the portion of the planarization layer located in the color pixel region is a thinner planarization layer and the thickness of the portion of the planarization layer located in the color pixel region is in a range from about 0 μm to about 1.5 μm, and a thickness of a portion of the planarization layer located in the non--pixel region is in a range from about 3 μm to about 3.5 μm: and
forming a display electrode on the planarization layer and connecting the display electrode to a drain electrode of the TFT through a via hole.

### Claim 2 (depends on 1)

The manufacturing method of a display substrate according to claim 1, wherein forming a planarization layer on the passivation layer and the color filter is synchronized with thinning a thickness of a portion of the planarization layer located in the color pixel region, wherein
forming a planarization layer comprises:
forming a planarization material thin film on the passivation layer and the color filter, the planarization material thin film comprising a completely-retained region, a partly-retained region and a non-retained region, the partly-retained region being corresponding to the color pixel region, and the non-retained region being corresponding to an area of the drain electrode;
masking and exposing the planarization material thin film by using a halftone mask; and
developing the planarization material thin film upon exposing to form the planarization layer.

### Claim 3 (depends on 1)

The manufacturing method of a display substrate according to claim 1, further comprising: forming a first via hole in an area on the planarization layer corresponding to the drain electrode, wherein
forming a passivation layer on the TFT comprises:
forming a passivation material film on the TFT,
forming a display electrode on the planarization layer comprises:
performing a single patterning process to the passivation material film to form a second via hole below the first via hole, with the remaining portion of the passivation material film constituting the passivation layer;
forming a transparent conductive material film on the planarization layer in the first via hole and the second via hole; and
performing a single patterning process to the transparent conductive material film to form a pattern of the display electrode, connecting the display electrode to the drain electrode through the first via hole and the second via hole.

### Claim 4 (depends on 1)

The manufacturing method of a display substrate according to claim 1, further comprising: forming a first via hole in an area on the planarization layer corresponding to the drain electrode, wherein
forming a passivation layer on the TFT comprises:
forming a passivation material film on the TFT; and
performing a single patterning process to the passivation material film to form a second via hole, the second via hole being disposed corresponding to the drain electrode and communicated with the first hole formed in a subsequent process, with the remaining portion of the passivation material film constituting the passivation layer,
forming a display electrode on the planarization layer comprises:
forming a transparent conductive material film on the planarization layer in the first via hole and the second via hole; and
performing a single patterning process to the transparent conductive material film to form a pattern of the display electrode, connecting the display electrode to the drain electrode through the first via hole and the second via hole.

### Claim 5 (depends on 1)

The manufacturing method of a display substrate according to claim 1, wherein the display substrate is an organic light-emitting diode (OLED) substrate, the display electrode is an anode, and the manufacturing method of the display substrate further comprises:
forming a pixel defining layer on the planarization layer, the pixel defining layer being provided with several receiving holes, and the receiving holes being disposed corresponding to the display electrode;
forming an organic light-emitting layer in the receiving holes;
forming a cathode on the organic light-emitting layer; and
forming a protective substrate on the cathode.

### Claim 6 (depends on 1)

The manufacturing method of a display substrate according to claim 1, wherein the display substrate is a liquid crystal display (LCD) substrate, the display electrode is a pixel electrode, and the manufacturing method of the display substrate further comprises:
forming a protective layer on the pixel electrode; and
forming an alignment layer on the protective layer.

### Claim 7 (depends on 1)

The manufacturing method of a display substrate according to claim 1, wherein the display substrate is further divided to have a white pixel region.

### Claim 8 (depends on 1)

The manufacturing method of a display substrate according to claim 1, wherein a difference between a thickness of a portion of the planarization layer located in the non-pixel region and a thickness of a portion of the planarization layer located in the color pixel region is in a range from 2 μm to 3 μm.

### Claim 9 (depends on 2)

The manufacturing method of a display substrate according to claim 2. wherein a difference between a thickness of a portion of the planarization layer located in the non-pixel region and a thickness of a portion of the planarization layer located in the color pixel region is in a range from about 2 μm to about 3 μm.