# US 11,307,501 B2 · Extreme ultraviolet light generating apparatus, extreme ultraviolet light generating method, and electronic device manufacturing method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,307,501 B2 - Document ID: US11307501B2 - Status: Granted - Kind: B2 - Application number: 17/089,289 - Filed: 2020-11-04 - Published: 2021-03-11 - Granted: 2022-04-19 - Earliest claimed: 2018-06-29 - Assignees: Gigaphoton Inc. - Applicants: Gigaphoton Inc. - Inventors: Kengo Hayashi - Web page: https://patentgrep.com/patent/US11307501B2 ## CPC - G03F 7/7055: {Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption} - G03F 7/20: Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) - G03F 7/70025: {by lasers} - G03F 7/70033: {by plasma extreme ultraviolet [EUV] sources} - H05G 2/0086: {Optical arrangements for conveying the laser beam to the plasma generation location} - H05G 2/0092: {Housing of the apparatus for producing X-rays; Environment inside the housing} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H05G: X-RAY TECHNIQUE (investigating or analysing materials by the use of X-rays G01N23/00; apparatus for X-ray photography G03B42/02; X-ray tubes H01J35/00; TV systems having X-ray input H04N5/321) ## Abstract An extreme ultraviolet light generating apparatus for generating extreme ultraviolet light in a chamber according to one aspect of the present disclosure includes a piezoelectric element provided in the chamber; a pressure sensor configured to detect pressure in the chamber; a gas introducing unit configured to introduce gas into the chamber; an exhaust unit configured to exhaust the gas from the chamber; and a control unit configured to control application of a voltage to the piezoelectric element. The control unit is configured to determine whether or not to apply a voltage to the piezoelectric element based on information on the pressure in the chamber obtained by the pressure sensor. ## Claims ### Claim 1 An extreme ultraviolet light generating apparatus for generating extreme ultraviolet light in a chamber, the extreme ultraviolet light generating apparatus comprising: a piezoelectric element provided in the chamber; a pressure sensor configured to detect pressure in the chamber; a gas introducing unit configured to introduce gas into the chamber; an exhaust unit configured to exhaust the gas from the chamber; and a control unit configured to control application of a voltage to the piezoelectric element, the control unit being configured to determine whether or not to apply a voltage to the piezoelectric element based on information on the pressure in the chamber obtained by the pressure sensor. ### Claim 2 (depends on 1) The extreme ultraviolet light generating apparatus according to claim 1, wherein when the pressure in the chamber is within a first range, the control unit determines not to apply a voltage to the piezoelectric element. ### Claim 3 (depends on 2) The extreme ultraviolet light generating apparatus according to claim 2, wherein the first range is 100 Pa or higher. ### Claim 4 (depends on 2) The extreme ultraviolet light generating apparatus according to claim 2, wherein when the gas in the chamber is air, the first range is 100 Pa or higher and 50 kPa or lower. ### Claim 5 (depends on 1) The extreme ultraviolet light generating apparatus according to claim 1, wherein while the exhaust unit is exhausting the gas from the chamber, the control unit determines not to apply a voltage to the piezoelectric element. ### Claim 6 (depends on 1) The extreme ultraviolet light generating apparatus according to claim 1, wherein the gas introducing unit introduces argon into the chamber. ### Claim 7 (depends on 1) The extreme ultraviolet light generating apparatus according to claim 1, wherein while the gas introducing unit is introducing the gas into the chamber, the control unit determines not to apply a voltage to the piezoelectric element. ### Claim 8 (depends on 1) The extreme ultraviolet light generating apparatus according to claim 1, wherein while a voltage is being applied to the piezoelectric element, the exhaust unit is prohibited from exhausting the gas from the chamber. ### Claim 9 (depends on 1) The extreme ultraviolet light generating apparatus according to claim 1, wherein while a voltage is being applied to the piezoelectric element, the gas introducing unit is prohibited from introducing the gas into the chamber. ### Claim 10 (depends on 2) The extreme ultraviolet light generating apparatus according to claim 2, wherein the control unit changes the first range in accordance with a type of gas introduced into the chamber by the gas introducing unit. ### Claim 11 (depends on 1) The extreme ultraviolet light generating apparatus according to claim 1, further comprising a display unit configured to display the type of gas introduced into the chamber by the gas introducing unit. ### Claim 12 (depends on 1) The extreme ultraviolet light generating apparatus according to claim 1, further comprising a laser beam condensing optical unit configured to adjust an applying position of a laser beam introduced into the chamber, wherein the laser beam condensing optical unit includes a laser beam condensing mirror, and a piezoelectric actuator configured to move a position of the laser beam condensing mirror, and the piezoelectric element is used in the piezoelectric actuator. ### Claim 13 (depends on 1) The extreme ultraviolet light generating apparatus according to claim 1, further comprising a target supply unit configured to supply a target substance into the chamber, wherein the target supply unit includes a nozzle configured to output the target substance in a liquid form, and a vibrating unit configured to vibrate the target substance supplied to the nozzle, and the piezoelectric element is used in the vibrating unit. ### Claim 14 An extreme ultraviolet light generating method for generating extreme ultraviolet light in a chamber, the extreme ultraviolet light generating method comprising: a pressure obtaining step of obtaining information on pressure in the chamber; a gas introducing step of introducing gas into the chamber; an exhausting step of exhausting the gas from the chamber; and a controlling step of switching between application and non-application of a voltage to a piezoelectric element provided in the chamber, the controlling step including determining whether or not to apply a voltage to the piezoelectric element provided in the chamber based on the information on the pressure in the chamber obtained in the pressure obtaining step. ### Claim 15 An electronic device manufacturing method comprising: irradiating a target substance supplied into a chamber with a laser beam introduced into the chamber to generate plasma from which extreme ultraviolet light is generated, with an extreme ultraviolet light generating apparatus, the extreme ultraviolet light generating apparatus including the chamber, a piezoelectric element provided in the chamber, a pressure sensor configured to detect pressure in the chamber, a gas introducing unit configured to introduce gas into the chamber, an exhaust unit configured to exhaust the gas from the chamber, and a control unit configured to control application of a voltage to the piezoelectric element, the control unit being configured to determine whether or not to apply a voltage to the piezoelectric element based on information on the pressure in the chamber obtained by the pressure sensor; outputting the extreme ultraviolet light to an exposure apparatus; and exposing the extreme ultraviolet light onto a photosensitive substrate within the exposure apparatus.