# US 11,307,499 B2 · Splicing nano-imprint template with repair adhesive layer, repair method of splicing seam thereof, and manufacturing method thereof

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- Number: US 11,307,499 B2
- Document ID: US11307499B2
- Status: Granted
- Kind: B2
- Application number: 16/830,820
- Filed: 2020-03-26
- Published: 2021-05-27
- Granted: 2022-04-19
- Earliest claimed: 2019-11-26
- Assignees: Boe Technology Group Co., Ltd.
- Applicants: Boe Technology Group Co., Ltd.
- Inventors: Yanhui Lu; Duohui Li; Xueyuan Zhou
- Web page: https://patentgrep.com/patent/US11307499B2

## CPC

- B29C 73/02: using liquid or paste-like material (B29C73/16 takes precedence)
- G03F 7/2002: {with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image}
- B29C 65/526: {by printing or by transfer from the surfaces of elements carrying the adhesive, e.g. using brushes, pads, rollers, stencils or silk screens}
- G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
- B29C 2035/0838: {using laser}
- H10P 76/00: Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P 76/2042: {using lasers}
- B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00)
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

Embodiments of the present disclosure provide a splicing nano-imprint template, a repair method of a splicing seam thereof, and a manufacturing method thereof. The repair method of the splicing seam of the splicing nano-imprint template includes: providing a splicing nano-imprint plate, in which the splicing nano-imprint plate includes a base substrate and splicing modules that are positioned on the base substrate, a splicing seam is provided between adjacent spicing modules, and each of the splicing modules includes a unit pattern; forming a repair adhesive layer at least at the splicing seam; and performing a patterning process on the repair adhesive layer to form a repair module, in which the repair module includes the unit pattern.

## Claims

### Claim 1

A repair method of a splicing seam of a splicing nano-imprint template, comprising:
providing a splicing nano-imprint plate, wherein the splicing nano-imprint plate comprises a base substrate and a plurality of splicing modules that are positioned on the base substrate, a splicing seam is provided between adjacent spicing modules, and each of the splicing modules comprises a unit pattern;
forming a repair adhesive layer at least at the splicing seam; and
performing a patterning process on the repair adhesive layer to form a repair module, wherein the repair module comprises the unit pattern, wherein
the repair adhesive layer is an imprint adhesive layer; and
the forming the repair adhesive layer at least at the splicing seam, comprises:
forming an anti-sticking layer on the splicing modules, and
forming the imprint adhesive layer at the splicing seam as the repair adhesive layer.

### Claim 2 (depends on 1)

The repair method according to claim 1, wherein the performing the patterning process on the repair adhesive layer to form the repair module, comprises:
imprinting the imprint adhesive layer by using an imprint template, wherein the imprint template comprises the unit pattern;
performing a curing process on the imprint adhesive layer by taking an edge of the imprint template as a boundary; and
separating the imprint template from the imprint adhesive layer to form the repair module.

### Claim 3 (depends on 1)

The repair method according to claim 1, wherein the forming the anti-sticking layer on the splicing modules, comprises:
forming the anti-sticking layer on the splicing modules by using a printing method, wherein a distance between an edge of the anti-sticking layer close to the splicing seam and an edge of one of the splicing modules close to the splicing seam is less than 1 micrometer.

### Claim 4 (depends on 3)

The repair method according to claim 3, wherein the edge of the anti-sticking layer close to the splicing seam is aligned with the edge of the one of the splicing modules close to the splicing seam.

### Claim 5 (depends on 1)

The repair method according to claim 1, wherein a material of the anti-sticking layer comprises fluorine-containing silane-based compounds.

### Claim 6 (depends on 1)

A manufacturing method of a splicing nano-imprint template, comprising: the repair method according to claim 1, wherein the manufacturing method further comprises:
providing the base substrate, wherein the base substrate comprises a plurality of splicing regions and the splicing seam positioned between adjacent splicing regions;
forming the plurality of splicing modules by using a nano-imprint method; and
respectively fixing the plurality of splicing modules to the splicing regions of the base substrate to form the splicing nano-imprint plate.

### Claim 7

A repair method of a splicing seam of a splicing nano-imprint template, comprising:
providing a splicing nano-imprint plate, wherein the splicing nano-imprint plate comprises a base substrate and a plurality of splicing modules that are positioned on the base substrate, a splicing seam is provided between adjacent spicing modules, and each of the splicing modules comprises a unit pattern;
forming a repair adhesive layer at least at the splicing seam; and
performing a patterning process on the repair adhesive layer to form a repair module, wherein the repair module comprises the unit pattern,
wherein the forming the repair adhesive layer at least at the splicing seam comprises:
forming a photoresist layer at the splicing seam as the repair adhesive layer
wherein the performing the patterning process on the repair adhesive layer to form the repair module comprises:
irradiating a portion of the photoresist layer by using a femtosecond laser so that the photoresist layer comprises a cured portion and an uncured portion; and
removing the uncured portion of the photoresist layer to form the repair module.

### Claim 8 (depends on 7)

The repair method according to claim 7, wherein a wavelength range of the femtosecond laser is 700 nm-900 nm.

### Claim 9 (depends on 8)

The repair method according to claim 8, wherein the wavelength of the femtosecond laser is 800 nm.

### Claim 10

A splicing nano-imprint template, comprising:
a base substrate,
a nano-imprint structure, positioned on the base substrate, and comprising a plurality of splicing modules and a repair module that is positioned between adjacent splicing modules, wherein the repair module and each of the splicing modules comprise a unit pattern;
a splicing seam provided between adjacent spicing modules, and each of the splicing modules comprises a unit pattern; and
a repair adhesive layer provided at least at the splicing seam;
wherein the repair adhesive layer is an imprint adhesive layer, and
the repair adhesive layer comprises an anti-sticking layer on the splicing modules.

### Claim 11 (depends on 10)

The splicing nano-imprint template according to claim 10, wherein an edge of one of the splicing modules close to the repair module is in direct contact with an edge of the repair module close to the one of the splicing modules.

### Claim 12 (depends on 10)

The splicing nano-imprint template according to claim 10, wherein each of the splicing modules comprises a plurality of the unit patterns that are arranged according to a period, and the repair module comprises a plurality of the unit patterns that are arranged according to the period.

### Claim 13 (depends on 12)

The splicing nano-imprint template according to claim 12, wherein at an interface where the repair module and one of the splicing modules contact with each other, the period is continuous.

### Claim 14 (depends on 13)

The splicing nano-imprint template according to claim 13, wherein
each of the unit patterns comprises a groove and a protrusion that are alternately provided;
an edge of the one of the splicing modules close to the repair module is provided with the groove, and an edge of the repair module close to the one of the splicing modules is provided with the protrusion; or, the edge of the one of the splicing modules close to the repair module is provided with the protrusion, and the edge of the repair module close to the one of the splicing modules is provided with the groove.

### Claim 15 (depends on 12)

The splicing nano-imprint template according to claim 12, wherein at an interface where the repair module and one of the splicing modules contact with each other, the period is discontinuous.

### Claim 16 (depends on 15)

The splicing nano-imprint template according to claim 15, wherein
each of the unit patterns comprises a groove and a protrusion that are alternately provided;
an edge of the one of the splicing modules close to the repair module is provided with the groove, and an edge of the repair module close to the one of the splicing modules is provided with the groove; or, the edge of the one of the splicing modules close to the repair module is provided with the protrusion, and the edge of the repair module close to the one of the splicing modules is provided with the protrusion.

### Claim 17 (depends on 10)

The splicing nano-imprint template according to claim 10, further comprising:
a seed layer, provided on a side of the nano-imprint structure away from the base substrate.

### Claim 18 (depends on 17)

The splicing nano-imprint template according to claim 17, wherein a material of the seed layer comprises nickel and/or copper.