Dual port remote plasma clean isolation valve

A system for processing a substrate, comprising:

• a remote plasma source;
• one or more process chambers fluidly coupled to the remote plasma source;
• and
• an isolation device disposed between the remote plasma source and the one or more process chambers, the isolation device comprising:
• a body having an inlet opening and at least one outlet opening;
• an isolation volume defined in the body;
• a first flap disposed within the isolation volume and comprising a first seal disposed in the first flap;
• and
• a second flap disposed within the isolation volume and comprising at least one second seal disposed in the second flap, wherein the first seal surrounds the at least one second seal and the at least one second seal surrounds the at least one outlet opening when the second flap is positioned to prevent access to the at least one outlet opening.

A method for processing a substrate comprising:

• blocking fluid communication between a remote plasma source and a process chamber with an isolation device, the blocking comprising:
• moving a first flap having a first seal about a first axis within an isolation volume of the isolation device from a first position in which the first flap blocks access to a first port disposed in a first end of the isolation device to an open position;
• and
• moving a second flap having at least one second seal about a second axis within the isolation volume of the isolation device from a second position to the open position, wherein:
• while in the open position the first seal surrounds the at least one second seal and forms a seal around the at least one second seal;
• and
• while the second flap is in the second position the second flap blocks access to outlet ports disposed in a second end of the isolation device, such that the at least one second seal surrounds the outlet ports.