# US 11,306,396 B2 · Oxide film forming device

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- Number: US 11,306,396 B2
- Document ID: US11306396B2
- Status: Granted
- Kind: B2
- Application number: 17/297,652
- Filed: 2019-09-05
- Published: 2022-01-13
- Granted: 2022-04-19
- Earliest claimed: 2018-11-30
- Assignees: Meidensha Corporation
- Applicants: Meidensha Corporation
- Inventors: Naoto Kameda; Toshinori Miura; Mitsuru Kekura
- Web page: https://patentgrep.com/patent/US11306396B2

## CPC

- C23C 16/45565: {Shower nozzles}
- C23C 16/402: {Silicon dioxide}
- C23C 16/45574: {Nozzles for more than one gas}
- C23C 16/45591: {Fixed means, e.g. wings, baffles}
- H10P 14/60: of insulating materials
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

Disclosed is an oxide film forming device including a furnace body in which a workpiece is placed and a furnace cover. A mixed gas diffusion part is disposed on an inner side of the furnace cover via a shield plate. A mixed gas buffer space is provided in the mixed gas diffusion part. A shower head plate is disposed on the mixed gas diffusion part and opposed to the workpiece at a distance of 1 to 100 mm away from the workpiece. An ozone gas buffer space is provided in the furnace cover. A gas flow diffusion plate is disposed in the ozone gas buffer space. The shower head plate has formed therein first slits through which an ozone gas flows and second slits through which a mixed gas flows. The first slits and the second slits are alternately arranged side by side in a short-dimension direction of the slits.

## Claims

### Claim 1

An oxide film forming device for forming an oxide film on a workpiece, comprising:
a treatment furnace in which the workpiece is placed; and
a shower head arranged facing a treatment target surface of the workpiece,
wherein the shower head comprises:
first slits for supplying an ozone gas to the workpiece; and
second slits for supplying to the workpiece an unsaturated hydrocarbon gas, a raw material gas containing a Si element or metal element which is a constituent element of the oxide film, or a mixed gas of the unsaturated hydrocarbon gas and the raw material gas,
wherein the first slits and the second slits are alternately arranged side by side in a short-dimension direction of the slits,
wherein a gas supply surface of the shower head is opposed to the treatment target surface of the workpiece at a distance of 1 mm to 100 mm away from the treatment target surface,
wherein a slit width of the first slits and a slit width of the second slits are larger than or equal to 0.1 mm and smaller than or equal to 10 mm and are different from each other, and
wherein an interval between slit centers of adjacent ones of the first slits and an interval between slit centers of adjacent ones of the second slits are larger than or equal to 1 mm and smaller than or equal to 100 mm.

### Claim 2 (depends on 1)

The oxide film forming device according to claim 1,
wherein the treatment furnace comprises:
a first gas supply port for supplying therethrough the ozone gas; and
a second gas supply port for supplying therethrough the unsaturated hydrocarbon gas, the raw material gas or the mixed gas, and
wherein the oxide film forming device comprises:
a first gas buffer space formed between the first gas supply port and the shower head to allow diffusion of the ozone gas; and
a second gas buffer space formed between the second gas supply port and the shower head to allow diffusion of the unsaturated hydrocarbon gas, the raw material gas or the mixed gas.

### Claim 3 (depends on 1)

The oxide film forming device according to claim 1,
wherein outermost ones of the first and second slits of the shower head are the first slits.

### Claim 4 (depends on 1)

The oxide film forming device according to claim 1,
wherein the shower head is in the form of a plate and is detachably disposed in the treatment furnace.