# US 11,306,390 B2 · ARC source > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,306,390 B2 - Document ID: US11306390B2 - Status: Granted - Kind: B2 - Application number: 16/753,734 - Filed: 2018-10-04 - Published: 2020-08-13 - Granted: 2022-04-19 - Earliest claimed: 2017-10-03 - Assignees: Oerlikon Surface Solutions AG, PfäFfikon - Applicants: Oerlikon Surface Solutions AG, Pfäffikon - Inventors: Siegfried Krassnitzer; Juerg Hagmann - Web page: https://patentgrep.com/patent/US11306390B2 ## CPC - C23C 14/325: {Electric arc evaporation} - C23C 14/0641: {Nitrides (C23C14/0617 takes precedence)} - C23C 14/243: {Crucibles for source material (C23C14/28, C23C14/30 take precedence)} - C23C 14/54: Controlling or regulating the coating process - H01J 37/32055: {Arc discharge} - H01J 37/32541: {Shape} - H01J 37/3255: {Material} - H01J 37/32559: {Protection means, e.g. coatings} - H01J 37/3266: {Magnetic control means} - H01J 37/32669: {Particular magnets or magnet arrangements for controlling the discharge} - H05H 1/50: and using applied magnetic fields, e.g. for focusing or rotating the arc - H01J 2237/152: Magnetic means - H01J 2237/332: Coating - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - H05H: PLASMA TECHNIQUE (apparatus or processes specially adapted for producing X-rays H05G2/00); PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS ## Abstract An ARC evaporator comprising: —a cathode assembly, —an electrode arranged for enabling that an arc between an electrode and a front surface of the target can be established, and—a magnetic guidance system placed in front of a back surface of the target characterized in that: the magnetic guidance system comprises means placed in a central region for generating at least one magnetic field and means in a peripherical region for generating at least one further magnetic field, wherein the magnetic fields generated in this manner result in a total magnetic field for guiding the arc and controlling the cathode spot path at the front surface of the target, wherein the means placed in the central region comprises one electromagnetic coil for generating a magnetic field and the means placed in the peripherical region comprises two electromagnetic coils for generating two further magnetic fields. ## Claims ### Claim 1 An ARC evaporator comprising: a cathode assembly comprising a cooling plate, a target as cathode element, the target having a thickness in a cross direction, a front surface disposed to be evaporated, and a back surface, the front surface being parallel to the back surface, the front surface and the back surface being separated from each other by a thickness of the target, the cathode assembly having a total height in a transversal direction and borders delimiting a total amplitude in a longitudinal direction, and the target defining a central region of the cathode assembly in the longitudinal direction, with a peripherical region of the cathode assembly extending beyond the target in the longitudinal direction, an electrode arranged for enabling an arc to be established between the electrode and the front surface of the target for causing evaporation of at least part of the front surface of the target, and a magnetic guidance system placed in front of the back surface of the target comprising means for generating one or more magnetic fields resulting in a total magnetic field comprising magnetic field lines which extend through a cross section of the target and along a space in front of the front surface of the target for guiding a cathode spot that results from contact of an arc to the target, when the arc is established between the electrode and the front surface of the target, wherein the magnetic guidance system in the ARC evaporator comprises means placed in the central region for generating at least one magnetic field and means in the peripherical region for generating at least one further magnetic field, wherein the magnetic fields generated in this manner result in a total magnetic field for guiding the arc and controlling the cathode spot path at the front surface of the target, wherein the means placed in the central region comprises one electromagnetic coil for generating a magnetic field and the means placed in the peripherical region comprises two electromagnetic coils for generating two further magnetic fields. ### Claim 2 (depends on 1) An ARC evaporator according to claim 1, wherein the magnetic guidance system comprises ferromagnetic material disposed surrounding the means for generating the magnetic fields, wherein the ferromagnetic material is distributed encircling the means with no ferromagnetic material placed between the magnetic guidance system and the cathode assembly. ### Claim 3 (depends on 1) An ARC evaporator according to claim 1, wherein the magnetic guidance system comprises ferromagnetic material disposed surrounding the means for generating the magnetic fields, wherein the ferromagnetic material is distributed partially encircling the means with no ferromagnetic material placed between the magnetic guidance system and the cathode assembly, wherein an upper part with length (S) of the electromagnetic coil placed in the central region as well as an upper part with length (S′) of the electromagnetic coil placed in the peripherical region but closest to the electromagnetic coil placed in the central region is not encircled by ferromagnetic material, resulting in a space comprising air, allowing in this manner that the total magnetic field that results from a sum of the generated magnetic fields exhibits more magnetic field lines that are parallel to the front surface of the target in comparison with a similar arc evaporator without having said space comprising air. ### Claim 4 (depends on 3) An ARC evaporator according to claim 3, wherein the upper length (S) is in the following range: 3 mm≤S≥15 mm, a target diameter (D1) is in the following range: 100 mm≤D1≥150 mm and a total diameter (D) of the cathode assembly is in the following range: 150 mm≤D≥200 mm. ### Claim 5 (depends on 4) An ARC evaporator according to claim 4, wherein the borders of the cathode assembly comprise a surrounding shield made of ferromagnetic material, wherein the surrounding shield has a total height in the transversal direction, said total height including a component (C) for causing a shielding effect of magnetic field lines extending in any longitudinal direction, establishing in this manner the borders of the cathode assembly as a limit of the extension of the magnetic field lines in any longitudinal direction. ### Claim 6 (depends on 5) An ARC evaporator according to claim 5, wherein the cathode assembly has a symmetrical construction comprising a disc-shaped target with a target diameter (D1) and the cathode assembly has a total diameter (D), wherein the component (C) has a value in the following range: D/20≤C≥D/5. ### Claim 7 (depends on 4) An ARC evaporator according to claim 4, wherein the target diameter is in the following range: 100 mm≤D1≥150 mm and the total diameter of the cathode assembly is in the following range: 150 mm≤D≥200 mm. ### Claim 8 (depends on 2) An ARC evaporator according to claim 2, wherein the ferromagnetic material is pure iron or ARMCO pure iron or construction steel or martensitic chromium steel. ### Claim 9 (depends on 8) An ARC evaporator according to claim 8, wherein the ferromagnetic material is construction steel S355J2. ### Claim 10 (depends on 1) A coating process conducted by using an ARC evaporator according to claim 1, comprising operating the ARC evaporator by adjusting the three electromagnetic coils which constitute a coil system producing an oscillation of the magnetic field, thereby adjusting an oscillation frequency for guiding the arcs running at the front surface of the target describing circular arc traces having different diameters. ### Claim 11 (depends on 10) The coating process according to claim 10, comprising using a circular target, which comprises a first material, forming an outer annular area of the target to be vaporized, and a second material, forming an inner area of the target to be vaporized. ### Claim 12 (depends on 11) The coating process according to claim 11, wherein the target comprises two or more materials distributed in such a manner, that by changing the diameter of the circular arc being operated at the target surface, the target material that is being vaporized is changed. ### Claim 13 (depends on 12) The coating process according to claim 12, wherein the at least two materials are aluminum and titanium. ### Claim 14 (depends on 11) The coating process according to claim 11, wherein a coating formed during operation of the ARC evaporator exhibits a multilayer structure. ### Claim 15 (depends on 10) The coating process according to claim 10, wherein the oscillation frequency is adjusted to be in a range between 0.1 Hz and 50 Hz.