# US 11,299,638 B2 · Synthesis of functional fluorinated polyhedral oligomeric silsesquioxane (“F-POSS”)

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 11,299,638 B2
- Document ID: US11299638B2
- Status: Granted
- Kind: B2
- Application number: 16/722,770
- Filed: 2019-12-20
- Published: 2020-06-11
- Granted: 2022-04-12
- Earliest claimed: 2011-09-21
- Assignees: The United States of America as represented by the Secretary of the Air Force
- Applicants: Government of the United States as Represented by the Secretary of the Air Force
- Inventors: Timothy S. Haddad; Joseph M. Mabry; Sean Ramirez
- Web page: https://patentgrep.com/patent/US11299638B2

## CPC

- C09D 5/1662: {Synthetic film-forming substance}
- B05D 5/083: {involving the use of fluoropolymers}
- C07F 7/21: Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
- C08G 77/045: {containing less than 25 silicon atoms}
- C09D 7/63: organic
- C08K 5/549: containing silicon in a ring
- C09D: COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics A61K; processes for applying liquids or other fluent materials to surfaces, in general, B05D; staining wood B27K5/02; glazes or vitreous enamels C03C; natural resins, French polish, drying-oils, driers, turpentine, per se, C09F; polishing compositions other than French polish, ski waxes C09G; adhesives or use of materials as adhesives C09J; materials for sealing or packing joints or covers C09K3/10; materials for stopping leaks C09K3/12; processes for the electrolytic or electrophoretic production of coatings C25D)
- B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02)
- C07F: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM (metal-containing porphyrins C07D487/22)
- C08G: MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08K: Use of inorganic or non-macromolecular organic substances as compounding ingredients (paints, inks, varnishes, dyes, polishes, adhesives C09)

## Abstract

A method of forming a hydrophobic and oleophobic surface. The method including spin coating an F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane onto an inert surface. The F-POSS has a structure: Each Rf represents a nonreactive, fluorinated organic group, R1 represents a first monovalent organic group comprising at least two carbon atoms, and R2 represents hydrogen or a second monovalent organic group comprising at least two carbon atoms. The F-POSS with 3,3-dichloro-1,1,1,2,2,-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane are then dried on the inert surface.

## Claims

### Claim 1

A hydrophobic and oleophobic substrate surface comprising:
a substrate having a surface; and
a hydrophobic and oleophobic layer on the surface of the substrate, the hydrophobic and oleophobic layer comprising an F-POSS with 3,3-dichloro-1,1,1,2,2-pentafluoropropane/1,3-dichloro-1,1,2,2,3-pentafluoropropane onto an inert surface, the F-POSS having a structure:
where each Rf represents a nonreactive, fluorinated organic group, R1 represents a first monovalent organic group comprising at least two carbon atoms and is selected from the group consisting of —(CH2)7CH3, —(CH2)3OC(O)CH═CH2, and —(CH2)3OC(O)C(CH3)═CH2, and R2 represents hydrogen or a second monovalent organic group comprising at least two carbon atoms.

### Claim 2 (depends on 1)

The hydrophobic and oleophobic substrate surface of claim 1, wherein Rf represents —CH2CH2(CF2)7CF3.

### Claim 3 (depends on 1)

The hydrophobic and oleophobic substrate surface of claim 1, wherein the first monovalent organic group, the second monovalent organic group, or both comprises at least three carbon atoms.

### Claim 4 (depends on 1)

The hydrophobic and oleophobic substrate surface of claim 1, wherein Rf represents a fluorinated alkyl group.

### Claim 5 (depends on 1)

The hydrophobic and oleophobic substrate surface of claim 1, wherein each Rf is separately selected from the group consisting of fluorotetradecyl, fluorododecyl, fluorodecyl, fluorooctyl, fluorohexyl, and hexafluoro-i-butyl.