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US 11,298,719 B2Granted
Device for modifying a linear substrate
AssigneeSouthwire Company
InventorJuan Alberto Galindo Gonzalez
Life of this patent
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Abstract
An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.
Claims20
A method for modifying an aspect of a linear substrate, the method comprising the steps of:
- providing a device having a chamber filled with a modifying fluid, the device comprising an outer processing vessel having a longitudinal length and an inner processing vessel, the inner processing vessel and the outer processing vessel forming a nested arrangement along the longitudinal length with at least a portion of the chamber defined therebetween, the inner processing vessel being axially moveable relative the outer processing vessel;
- defining an exposure gap within the chamber, wherein defining the exposure gap within the chamber comprises defining the exposure gap between an infeed seal formed at a first end of the outer processing vessel and an inner seal formed at a first end of the inner processing vessel, wherein at a minimum length of the exposure gap the first end of the inner processing vessel being closer to the first end of the outer processing vessel than a second end of the outer processing vessel, the second end of the outer processing vessel being opposite the first end of the outer processing vessel, wherein the at least one of the infeed seal and the inner seal being moveable with respect to the other of the infeed seal and the inner seal between a plurality of relative positions, each of the relative positions defining a different length of the exposure gap, and wherein a maximum length of the exposure gap is less than the longitudinal length of the outer processing vessel;
- adjusting a length of the exposure gap;
- traversing a linear substrate across the exposure gap at a given speed;
- and
- maintaining a constant exposure time of the linear substrate with the modifying fluid while traversing the exposure gap.
3 more elements
A method for modifying an aspect of a linear substrate, the method comprising the steps of:
- providing a device having a chamber filled with a modifying fluid, the device comprising an outer processing vessel having a longitudinal length and an inner processing vessel, the inner processing vessel and the outer processing vessel forming a nested arrangement along the longitudinal length of the outer processing device with at least a portion of the chamber defined therebetween, the inner processing vessel being axially moveable relative the outer processing vessel;
- defining an exposure gap within the chamber, wherein defining the exposure gap within the chamber comprises defining the exposure gap between an infeed seal formed at a first end of the outer processing vessel and an inner seal formed at a first end of the inner processing vessel, wherein at a minimum length of the exposure gap the first end of the inner processing vessel being closer to the first end of the outer processing vessel than a second end of the outer processing vessel, the second end of the outer processing vessel being opposite the first end of the outer processing vessel, wherein the at least one of the infeed seal and the inner seal being moveable with respect to the other of the infeed seal and the inner seal between a plurality of relative positions, each of the relative positions defining a different length of the exposure gap, and wherein a maximum length of the exposure gap is less than the longitudinal length of the outer processing vessel;
- traversing a linear substrate across the exposure gap;
- and
- varying a length of the exposure gap with varying speeds of the linear substrate during traversing of the linear substrate across the exposure gap.
2 more elements
A method for modifying an aspect of a linear substrate, the method comprising the steps of:
- providing a device comprising an outer processing vessel having a longitudinal length and an inner processing vessel, the inner processing vessel and the outer processing vessel forming a nested arrangement along the longitudinal length of the outer processing device;
- defining an exposure gap between an infeed seal formed at a first end of the outer processing vessel and an inner seal formed at a first end of the inner processing vessel, wherein at a minimum length of the exposure gap the first end of the inner processing vessel being closer to the first end of the outer processing vessel than a second end of the outer processing vessel, the second end of the outer processing vessel being opposite the first end of the outer processing vessel, wherein the at least one of the infeed seal and the inner seal being moveable with respect to the other of the infeed seal and the inner seal between a plurality of relative positions, each of the relative positions defining a different length of the exposure gap, and wherein a maximum length of the exposure gap is less than the longitudinal length of the outer processing vessel;
- providing a modifying liquid in the exposure gap;
- traversing a linear substrate across the exposure gap;
- and
- varying a length of the exposure gap with varying speeds of the linear substrate traversing the exposure gap.
3 more elements
Dependencies are inferred from the claim text.