Production method for antenna substrate, production method for antenna substrate with wiring line and electrode, and production method for RFID element

A method for producing an antenna substrate with wiring line and electrode, comprising the steps of:

• (1-P) forming a coating film using a photosensitive paste containing a conductive material and a photosensitive organic component on an insulating substrate having an antenna thereon;
• (2-P-B) processing the coating film into a pattern corresponding to a wiring line by photolithography;
• (2-P-C) processing the coating film into a pattern corresponding to an electrode by photolithography;
• (3-P-B) curing the pattern corresponding to a wiring line into a wiring line;
• and
• (3-P-C) curing the pattern corresponding to an electrode into an electrode,
• wherein steps (2-P-B) and (2-P-C) are performed at the same time in a batch manner such that a connection between the wiring line and electrode is continuous, and
• wherein the electrode is operatively connected to a TFT or a capacitor.

A method for producing an RFID element, comprising the steps of:

• (1) forming a coating film using a photosensitive paste containing a conductive material and a photosensitive organic component on an insulating substrate;
• (2-A) processing the coating film into a pattern corresponding to an antenna by photolithography;
• (2-B) processing the coating film into a pattern corresponding to a wiring line by photolithography;
• (2-C) processing the coating film into a pattern corresponding to an electrode by photolithography;
• (3-A) curing the pattern corresponding to an antenna into an antenna;
• (3-B) curing the pattern corresponding to a wiring line into a wiring line;
• (3-C) curing the pattern corresponding to an electrode into one or more electrodes to give an antenna substrate with wiring line and electrode;
• and
• (4-S) forming a semiconductor layer on one or more of the electrodes or between the electrodes of the antenna substrate with wiring line and electrode,
• wherein steps (2-A), (2-B), and (2-C) are performed at the same time in a batch manner such that connections among the antenna, wiring line and electrode are continuous, and
• wherein the one or more electrodes are operatively connected to a TFT or a capacitor.

A method for producing an RFID element, comprising the steps of:

• (1-P) forming a coating film using a photosensitive paste containing a conductive material and a photosensitive organic component on an insulating substrate having an antenna thereon;
• (2-P-B) processing the coating film into a pattern corresponding to a wiring line by photolithography;
• (2-P-C) processing the coating film into a pattern corresponding to an electrode by photolithography;
• (3-P-B) curing the pattern corresponding to a wiring line into a wiring line;
• (3-P-C) curing the pattern corresponding to an electrode into one or more electrodes to give an antenna substrate with wiring line and electrode;
• and
• (4-S) forming a semiconductor layer on one or more of the electrodes or between the electrodes of the antenna substrate with wiring line and electrode,
• wherein steps (2-P-B) and (2-P-C) are performed at the same time in a batch manner such that a connection between the wiring line and electrode is continuous, and
• wherein the one or more electrodes are operatively connected to a TFT or a capacitor.